crosswise double diffusion MOFET and manufacturing method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHENGDU MONOLITHIC POWER SYST
- Publication Date
- 2012-10-17
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
[0001] Related references
[0002] This application claims priority to and benefit from, and is hereby incorporated in its entirety by, Patent Application No. 13 / 213,011 filed in the United States on August 18, 2011. technical field
[0003] Embodiments of the present invention relate to semiconductor devices, and more particularly, to lateral double-diffused metal-oxide-semiconductor field effect transistors. Background technique
[0004] Lateral double-diffused metal-oxide-semiconductor field-effect transistors (LDMOS) are widely used in various integrated power management circuits. Generally, LDMOS is used as a power transistor in these power management circuits to continuously switch on and off in response to a control signal to realize power conversion.
[0005] Figure 1A A schematic longitudinal cross-sectional view of an LDMOS 100 is shown. Such as Figure 1A As shown, the LDMOS 100 can be formed on a P-type semiconductor substrate 101 . The LDMOS 100 may include ...