Manufacturing method for LiCoO2 sintered body, and sputtering target made from same
A manufacturing method and a technology for sputtering targets, which are applied in the field of sputtering targets and can solve the problems of inability to stably manufacture high-density sintered bodies, inability to easily reach, and easy to crack.
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Embodiment 1
[0061] The average particle size (ie D 50 , hereinafter the same) a specified amount of LiCoO of 5 to 6 μm 2 Raw material powder ("CellSeed (registered trademark) C-5" manufactured by Nippon Chemical Industry Co., Ltd.) was uniformly filled in the mold, and placed in the chamber of the vacuum heat press together with the mold. Then, the inside of the chamber was decompressed to 0.013Pa (1×10 -4 support). After reaching the desired degree of vacuum, the Figure 5 The temperature-load curve shown begins to heat the raw powder. That is, after heating from room temperature to 450° C. at a rate of temperature increase of 6° C. / min, the temperature was maintained for 10 minutes. Then heat up to the set sintering temperature (80) (0)°C) at a heating rate of 3°C / min. At this time, at the moment when the temperature reaches 500°C, at 150kg / cm 2 The pressure of the raw material powder was pressed for 10 minutes. Keep the raw material powder at 800°C for 1 hour, and within half an...
Embodiment 2
[0066] A sintered body was produced under the same conditions as in Example 1 above except that the set sintering temperature was set to 820°C. After measuring the relative density and average particle diameter of the obtained sintered body, the relative density was 95.9%, and the average particle diameter was about 15 μm.
Embodiment 3
[0068] A sintered body was produced under the same conditions as in Example 1 above except that the set sintering temperature was set to 840°C. The relative density and average particle size of the obtained sintered body were measured, and the relative density was 97%, and the average particle size was about 20 μm.
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