Device and method for measuring radar reflection characteristic of plasma coating material

A plasma and radar reflection technology, which is used in measurement devices, analytical materials, and material analysis using radiation diffraction. Measure the effect of accurate, uniform plasma coating
CN102809577AActive Publication Date: 2012-12-05XIDIAN UNIV
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
XIDIAN UNIV
Publication Date
2012-12-05

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Abstract

The invention discloses a device and a method for measuring the radar reflection characteristic of a plasma coating material. The device comprises a large-area uniform unmagnetized plasma generation unit, a radar cross section measurement mechanism, a microwave unreflected chamber, a supporting guide rail, a supporting sliding block, a measured material plate and a wave-absorbing material, wherein the large-area uniform unmagnetized plasma generation unit and the radar cross section measurement mechanism are fixed in the microwave unreflected chamber; the large-area uniform unmagnetized plasma generation unit is surrounded in a space by the wave-absorbing material; and the wave-absorbing material is provided with a window, so that the measured material plate of the large-area uniform unmagnetized plasma generation unit directly faces the radar cross section measurement mechanism. By the device and the method, plasma can be coated on the surface of a measured material, and the adjustment of the thickness of the plasma and the weakening of the radar echo reflection of a body are further realized, so that the development of the experimental measurement of the radar reflection characteristic of the plasma coating material is met.
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Description

technical field

[0001] The invention belongs to the technical field of microwave / radar detection, and relates to a device and method for measuring radar reflection characteristics of plasma-coated materials, which can be used to uniformly coat plasma on a material to be tested and measure its radar reflection characteristics. Background technique

[0002] As a special dispersion medium, plasma has unique absorption, reflection and scattering properties for electromagnetic waves, which is very different from various conventional materials. Generally, during the high-speed re-entry process of targets such as various spacecraft and warheads, plasma will be produced to cover itself due to friction and high temperature, and its surface is equivalent to a composite material covered with plasma, thereby changing the radar reflection characteristics of the target itself ( Usually to attenuate radar echoes). Therefore, the study of materials and target characteristics under plasma c...

Claims

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