Adhesive tape for manufacturing semiconductor devices and method for manufacturing semiconductor devices by using adhesive tape
An adhesive tape and semiconductor technology, which is applied in the fields of semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., can solve the problems of difficult to find joint damage and processing, and achieve easy processing, reduce defect rate, and prevent leakage. Effect
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Embodiment 1
[0065] Prepared solution A (curing agent): with respect to every 100 parts by weight of carboxylated rubber resin, to 1 part by weight of dicumyl peroxide, 4 parts by weight of cyanoguanidine and 0.01 parts by weight of 2-methylimidazole 5 parts by weight of ethyl acetate (EA) was added, and the resulting solution was stirred for 1 hour.
[0066] Prepared solution B (additive): For every 100 parts by weight of carboxylated rubber resin, 80 parts by weight of ethyl acetate was added to 70 parts by weight of silane-modified epoxy resin and 10 parts by weight of bisphenol A novolac ester (EA), and the resulting solution was stirred for 1 hour.
[0067] After completing the preparation of solutions A and B as described above, 100 parts by weight of a carboxylated rubber resin having a molecular weight of 90000 was mixed with 200 parts by weight of methyl ethyl ketone (MEK) and the resulting solution was stirred for 1 hour. Then, the prepared solution A (curing agent) was added to...
Embodiment 2
[0069] Similar to Example 1, Prepared Solution A and Prepared Solution B were prepared in advance. 100 parts by weight of a carboxylated rubber resin having a molecular weight of 450,000 was mixed with 200 parts by weight of methyl ethyl ketone (MEK), followed by stirring for 1 hour. Then, the prepared solution A (curing agent) was added and stirred for 1 hour, and thereafter, the prepared solution B was added and stirred for another 1 hour, thereby obtaining an adhesive composition for an adhesive tape for manufacturing a semiconductor device. The adhesive composition was coated on a polyimide film (SKC Kolon, LN100) with a thickness of 25 μm, then dried at 130° C. for 3 minutes, and then a PET peeling film (Korean Toray Advanced Technology Co., Ltd.) with a thickness of 38 μm was applied. Materials Co., Ltd., XD5BR) was laminated on the dried polyimide film and aged at 45° C. for 48 hours, thereby obtaining an adhesive tape having an adhesive layer with a thickness of 6 μm. ...
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