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Refraction and reflection projection objective with large view field

A technology of projection objective lens and reflector, which is applied in the field of large field of view catadioptric projection objective lens, can solve the problems of increasing the difficulty of achieving uniformity of illumination, increasing the overall volume of the optical system, etc., reducing the size of the reflector and reducing the difficulty of manufacturing Effect

Active Publication Date: 2015-07-22
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The second embodiment of the patent increases the field of view, which also depends on the increase in the aperture of the reflective primary mirror, and at the same time the overall volume of the optical system also increases
On the other hand, the height-to-width ratio of the circular field of view in this patent is 55:1. This narrow and long field of view increases the difficulty of achieving uniformity of illumination.

Method used

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  • Refraction and reflection projection objective with large view field
  • Refraction and reflection projection objective with large view field
  • Refraction and reflection projection objective with large view field

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] The optical system structure 10 of the first embodiment of the projection objective lens of the present invention is as follows: figure 1 shown. The parameters required are shown in Table 1.

[0019] Table 1

[0020] Working wavelength

i line

Image side numerical aperture NA

0.05

Magnification

-2

[0021] The optical system 10 includes two optical mirror groups G11 and G12. The first optical lens group G11 has a positive refractive power and is composed entirely of refractive lenses. The first optical mirror group G11 includes two sub-lens groups G11-1n and G11-2n. The refractive power of the first sub-lens group G11-1n is positive, and can be composed of at least one positive lens and at least one negative lens. In Embodiment 10, the first sub-lens group G11-1n includes two adjacent positive lenses, and the function is Produce telecentricity. The second sub-lens group G11-2n includes at least two lenses, at least one...

Embodiment 2

[0032] The optical system structure 20 of the second embodiment of the projection objective lens of the present invention is as follows: figure 2 shown. The projection objective optical system includes two optical mirror groups G21 and G22. The first optical lens group G21 has a positive refractive power and is all composed of refractive lenses. It includes two sub-lens groups G21-1n and G21-2n. The refractive power of the first sub-lens group G21-1n is positive, and can be composed of at least one positive lens and at least one negative lens. In this embodiment, the first sub-lens group G21-1n includes two adjacent positive lenses. It is to produce the telecentricity of things. The second sub-lens group G21-2n includes at least two lenses, at least one positive lens is made of low dispersion glass, where low dispersion glass refers to a material with an Abbe number greater than 65; at least one negative lens is made of high dispersion glass, where High dispersion glass r...

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Abstract

The invention relates to a refraction and reflection projection objective with a large view field. The refraction and reflection projection objective comprises a first optical lens group and a second optical lens group. In the first optical lens group, all the optical elements are lenses, and the focal power of the first optical lens group is positive. The second optical lens group includes two mirrors and three lenses at least, and the focal power of the second optical lens group is positive. The optical elements of the first optical lens group and the second optical lens group are coaxial, and the two mirrors are positioned at the end of an optical path to reflect the optical path so as to shorten the optical path. The projection objective can be designed with 2X magnification and can meet actual requirements of products, while the size of the mirrors is reduced greatly, manufacturing difficulty is lowered, and the ratio of height to width of the view field can be controlled within a reasonable range.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a large field of view catadioptric projection objective lens applied to a semiconductor photolithography device. Background technique [0002] At present, in the field of semiconductor or liquid crystal flat panel (FPDs) processing, catadioptric or total reflection systems have many different forms of applications due to their advantages in chromatic aberration correction. And most of them take large exposure field of view and wide spectral bandwidth as the main design goals. At the same time, in order to match the size of the mask, many optical systems use projection objectives with a magnification greater than 1 or even close to 2 times. [0003] US2004 / 0263429A1 introduces a projection objective lens for flat panel displays (FPDs), with an exposure spectrum of ghi lines, mainly composed of a reflective primary mirror (which can be divided into two parts) an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B17/08G03F7/20
Inventor 武珩黄玲
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD