Test system for distribution characteristics of artificial plasmas
A technology of plasma and distribution characteristics, which is applied in the field of test systems for ion distribution characteristics, can solve the problems of test methods that do not form plasma characteristics, and achieve the effects of improving test efficiency and suppressing secondary electron emission
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0017] See attached figure 1 , a test system for artificial plasma distribution characteristics, which includes: electric propulsion 1, Langmuir probe, retardation potential analyzer, vacuum system 6 and signal collection device;
[0018] The electric propulsion 1 is installed inside the vacuum system 6, and the electric propulsion 1 can be used to generate artificial plasma;
[0019] The diameter of the probe of the Langmuir probe among the present invention is 5.6cm, and the surface of the probe adopts ion sputtering gold plating process, and the thickness of the gold-plated film is 200-500nm; figure 2 , when the probe is inserted into the plasma, if the potential of the probe is much lower than the potential of the surrounding plasma, the probe receives the ions in the surrounding plasma and repels the electrons in the plasma. At this time, the probe current is the ion saturation current, Corresponding to the ion saturation region in the I-V curve diagram; with the gradua...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Probe diameter | aaaaa | aaaaa |
Diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com