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How to make a circuit structure

A technology of circuit structure and manufacturing method, which is applied in printed circuit manufacturing, printed circuit, electrical components and other directions, can solve the problems of long electroplating time material cost and time cost, prolonged electroplating time, uneven thickness distribution, etc., to avoid manufacturing cost The effect of wasting time and cost and avoiding environmental pollution

Inactive Publication Date: 2016-03-02
UNIMICRON TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the material cost and time cost of longer electroplating time to form a thicker conductive copper layer, the material cost and time cost of removing the conductive copper layer on the surface of the dielectric layer, and the excessive and unnecessary The production cost and time cost of the by-products and waste derived from the production conditions are a waste
Furthermore, the conductive copper layer increased by prolonging the electroplating time may also have uneven thickness distribution, which will not be conducive to the subsequent production of build-up circuit layers on it, let alone the production of stacked hole design or higher wiring. The problem of low production process yield of density circuit board and low reliability circuit structure
In addition, if photolithography and etching are used to form the circuit structure, it will face problems such as the use of a large amount of chemical liquid, which will cause environmental pollution and increase production costs.

Method used

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  • How to make a circuit structure
  • How to make a circuit structure
  • How to make a circuit structure

Examples

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Embodiment Construction

[0033] Figure 1A to Figure 1G It is a schematic top view of a manufacturing method of a circuit structure according to an embodiment of the present invention. Figure 2A to Figure 2G respectively draw along Figure 1A to Figure 1G Schematic cross-section of the line I-I. Please also refer to Figure 1A and Figure 2A According to the manufacturing method of the circuit structure of this embodiment, first, a circuit substrate 110 is provided, wherein the circuit substrate 110 has a first surface 113 and a third surface 115 opposite to each other, a first patterned circuit layer 114 and a The second patterned circuit layer 116 . In this embodiment, the first patterned circuit layer 114 is disposed on the first surface 113 , and the second patterned circuit layer 116 is disposed on the second surface 115 .

[0034] It should be noted that, in other unillustrated embodiments, the first patterned circuit layer 114 and the second patterned circuit layer 116 can also be embedded ...

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Abstract

The invention discloses a method for manufacturing a circuit structure. It includes laminating a dielectric layer with a second surface on a first surface of a circuit substrate and a first patterned circuit layer. Form at least one blind hole extending from the second surface to the first patterned circuit layer and an indented pattern. A patterned photoresist layer having at least one opening exposing the blind hole and the recessed pattern is formed on the second surface. The area where the patterned photoresist layer is located is defined as the first area, and the area outside the first area is defined as the second area. An activation layer is formed in the first and second regions. The patterned photoresist layer and the activation layer located in the first area are removed to leave the activation layer located in the second area. A conductive material is formed on the activation layer located in the second region. Remove part of the conductive material and part of the activation layer located in the second area.

Description

technical field [0001] The invention relates to a method for manufacturing a circuit structure, and in particular to a method for manufacturing a circuit structure with thin circuits. Background technique [0002] Generally speaking, the circuit structure of the circuit board is usually formed by photolithography and etching processes or laser ablation. Taking the existing manufacturing process of the buried circuit structure formed by laser ablation as an example, it includes the following steps. First, a dielectric layer is provided. Then, a laser beam is irradiated on the surface of the dielectric layer to form an intaglio pattern and a blind hole connected to the circuit layer. Then, a pre-treatment is performed to remove the smear or residue left after the laser (especially the surface of the circuit layer exposed at the bottom of the blind hole). Then, a palladium layer is formed on the surface of the dielectric layer and in the formed concave patterns and blind hol...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05K3/10H05K3/18
Inventor 张启民余丞博
Owner UNIMICRON TECH CORP
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