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Furnace tube cap of phosphorus diffusion furnace

A phosphorus diffusion, furnace tube technology, applied in the directions of diffusion/doping, crystal growth, electrical components, etc., can solve problems such as operator hazards, phosphorus oxychloride leakage, etc., to extend service life, reduce diffusion, and prevent damage Effect

Inactive Publication Date: 2013-05-15
陈功
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These ventilation devices are generally made of stainless steel or iron sheets, but phosphorus oxychloride is very corrosive, and usually these ventilation pipes will be corroded thoroughly in half a year to a year, and phosphorus oxychloride will leak out, which will cause great harm to the operator. big hazard

Method used

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  • Furnace tube cap of phosphorus diffusion furnace
  • Furnace tube cap of phosphorus diffusion furnace
  • Furnace tube cap of phosphorus diffusion furnace

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Embodiment Construction

[0024] Such as figure 2 Shown, is the general structure of the phosphorus oxychloride removal device of the phosphorus diffusion furnace that applies furnace cap 1 of the present invention, and it comprises buffer tank 2, exhaust pipe 3 and sealing water tank 4, also comprises a simultaneously Figure 7 In the cooling tank 5 shown, the opening of the furnace tube goes deep into the buffer box 2, and the furnace cap 1 is located in the buffer box and is sleeved on the opening of the furnace tube.

[0025] Such as image 3 and Figure 4 As shown, it is the furnace cap 1 of the phosphorus diffusion furnace tube of the present invention, which includes a cylindrical quartz material cap body 10 with a closed bottom, and an outwardly protruding opening nozzle 12 is provided at the bottom of the cap body 10. A quartz snap ring 13 is welded on the inner wall of the bottom of the cap body, and the opening extension is arranged between the bottom surface of the snap ring and the bott...

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PUM

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Abstract

The invention discloses a furnace tube cap of a phosphorus diffusion furnace. The furnace tube cap of the phosphorus diffusion furnace comprises a cylindrical quartz material cap body of which the bottom part is sealed, wherein an opening nozzle protruding outwards is arranged at the bottom part of the cap body; a quartz snap ring is welded at the inner wall of the bottom part of the cap body; the opening nozzle is arranged between the bottom surface of the snap ring and the bottom wall of the cap body; and a quartz handle is welded at the outer wall of the bottom part of the cap body. The furnace cap disclosed by the invention is sleeved on the furnace tube opening; the furnace cap is made of quartz material, and is high in heat stability; the opening nozzle at the side of the bottom part of the quartz furnace cap is opposite to the air inlet of the exhaust tube for releasing phosphorus oxychloride gas discharged from the furnace tube of the phosphorus diffusion furnace; a quartz snap ring is welded at the inner wall of the bottom part of the cap body; the width of the opening nozzle is just preserved between the bottom part and the snap ring; the opening part of the furnace tube resists against the snap ring and does not block the opening nozzle; and a quartz handle is welded at the bottom part of the furnace cap. Therefore, the operation is facilitated.

Description

technical field [0001] The invention relates to the field of manufacturing semiconductor discrete devices and solar cells. Background technique [0002] Phosphorus diffusion is a necessary process for manufacturing PN junctions of semiconductor discrete devices, integrated circuit chips and solar cells. At present, the technology used in this process is thermal diffusion technology. Semiconductor discrete devices are mainly used to manufacture diodes, triodes, power devices, IGBTs and thyristors, etc. This series of products has sales of tens of billions in China, and the production capacity is very large. On the other hand, as the use of solar cells, silicon wafers are also widely used. More than 70% of solar cells in the world use silicon wafers as cells. In 2011, the production capacity of 25GW has been achieved, and the polycrystalline consumption has reached 180,000 tons, which is six times the semiconductor consumption, so the output of solar energy is greater than th...

Claims

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Application Information

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IPC IPC(8): C30B31/16H01L21/223
Inventor 陈功
Owner 陈功