Plasma treatment device

A processing device, plasma technology, applied in the direction of discharge tubes, electrical components, circuits, etc., can solve the problems of unevenness, low plasma efficiency, uneven plasma gas, etc.

Active Publication Date: 2013-05-15
BOFFOTTO ELECTRONICS TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In general plasma processing equipment, when the gas flow flows between the electrodes, the plasma gas generated is not uniform, which leads to the problem of non-uniformity during plasma processing.
Moreover, the gas can only be partially ionized between the two electrodes, and the efficiency of plasma generation is low, which also leads to a decrease in the efficiency of plasma treatment.

Method used

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Embodiment Construction

[0027] The present invention will be further elaborated below in conjunction with the accompanying drawings and specific embodiments.

[0028] Such as figure 1 , figure 2 , Figure 5 , Figure 6 As shown, a plasma processing device includes a vacuum chamber 100 and a plasma generation assembly 200, and the plasma generation assembly 200 includes:

[0029] The plasma generation chamber 220 is opened on the chamber wall of the vacuum chamber body 100;

[0030] The electrode module 240 is arranged in the plasma generating chamber 220, the discharge end of the electrode module 240 is facing the inside of the vacuum chamber 100, and the electrode module 240 is composed of a plurality of tubular electrodes 242 arranged in a parallel matrix composition;

[0031] A microwave plasma excitation source 260 is electrically connected to the electrode module 240;

[0032] The gas delivery pipe 280 communicates with the plasma generation chamber 220 from the side wall of the plasma ge...

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Abstract

The invention discloses a plasma treatment device which comprises a vacuum chamber and plasma generating assemblies. Each plasma generating assembly comprises a plasma generating cavity, an electrode module, a microwave plasma excitation source and a gas conveying pipeline, wherein the plasma generating cavity is formed in the chamber wall of the vacuum chamber, the electrode module is arranged inside the plasma generating cavity, an electro-discharge end of the electrode module faces right towards the inside of the vacuum chamber, and the electrode module is composed of multiple tubular electrodes which are arranged in a parallel matrix mode. The microwave plasma excitation sources are in electric connection with the electrode modules, each gas conveying pipeline is communicated with one plasma generating cavity from one side wall of the plasma generating cavity. According to the plasma treatment device, when gas flows inside the plasma generating cavities, the gas is blocked by the side walls of the plasma generating cavities and then turns to enter the vacuum chamber. In the flowing process, the flow rate of the gas is reduced, and the gas is fully ionized; the gas is mixed to form turbulent flow, and therefore plasma in the gas is enabled to be mixed uniformly. The gas passes through the plasma generating assemblies to form uniform plasma gas which is used for carrying out plasma treatment on products, and therefore the treatment effect is good.

Description

technical field [0001] The invention relates to the field of surface treatment equipment, in particular to a plasma treatment device. Background technique [0002] Plasma, also known as plasma, is composed of charged particles such as electrons and ions and neutral particles (atoms, molecules, micromaterials, etc.), and is a mixed gas that is quasi-neutral macroscopically and has a collective effect. [0003] At present, plasma treatment equipment is widely used in plasma cleaning, etching, plasma plating, plasma coating, plasma ashing and surface activation, modification and other occasions. Through its treatment, the wetting ability of the material can be improved, so that various materials can be coated, plated, etc., the adhesion and bonding force can be enhanced, and organic pollutants, oil or grease can be removed at the same time. [0004] In general plasma processing equipment, when the gas flow flows between the electrodes, the plasma gas generated is not uniform, ...

Claims

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Application Information

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IPC IPC(8): H01J37/32
Inventor 赵芝强
Owner BOFFOTTO ELECTRONICS TECH
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