Stimulated radiation based Mirau fluorescence interference microscopic measurement device
A technology of stimulated radiation and interference microscopy, applied in measurement devices, optical devices, instruments, etc., can solve the problems that the detection light is difficult to return, the detection system cannot achieve high NA and high slope surface detection, etc., to overcome the phase blur. effect of the problem
Inactive Publication Date: 2013-05-22
HARBIN INST OF TECH
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[0010] In order to solve the problem that it is difficult for the detection light to return to the detection system and thus cannot achieve high NA and high slope surface detection, the invention discloses a Mirau fluorescence interference microscopic measurement device based on stimulated radiation
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[0018] The specific embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0019] The structural schematic diagram of the Mirau fluorescence interference microscopic measuring device based on stimulated radiation of the present embodiment is as follows figure 1 shown. The measuring device includes a laser 1, a converging objective lens 2 arranged on the direct optical path of the laser 1 along the light propagation direction, a first pinhole 3, a collimating beam expanding objective lens 4 and a beam splitter 5; Objective lens 6, displacement driver 7, reference mirror 8, dichroic prism 9 and measured object 10; imaging converging objective lens 11, narrowband filter 12, second pinhole 13 and detector 14 arranged on the transmission path of beam splitter 5; The surface of the tested part 10 and the reference mirror 8 is coated by vacuum evaporation coating method.
[0020] The numerical aperture of the ...
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The invention belongs to the technical field of surface topography measurement and relates to a stimulated radiation based Mirau fluorescence interference microscopic measurement device. The measurement device comprises a laser device, a converging objective lens, a first pinhole, a collimation and beam expanding objective lens, a beam splitter, a focusing objective lens, a displacement driver, a reference mirror, a beam splitting prism, a measured piece, an imaging converging objective lens, a narrow-band filter, a second pinhole and a detector, wherein the converging objective lens, the first pinhole, the collimation and beam expanding objective lens and the beam splitter are disposed on a direct light path of the laser device along a light transmitting direction, the focusing objective lens, the displacement driver, the reference mirror, the beam splitting prism and the measured piece are disposed on a reflected light path of the beam splitter, and the imaging converging objective lens, the narrow-band filter, the second pinhole and the detector are disposed on a transmission light path of the beam splitter. Surfaces of the measured piece and the reference mirror are coated by the aid of a vacuum evaporation coating method. By the design that surface properties of the measured piece are changed through coating, measurement light is guaranteed to be capable of returning to a detection system after being reflected by a measured surface, high-NA(numerical aperture) and high-slope surface detection is achieved, and the measurement device is applicable to ultra-precise measurement of three-dimensional topographies of high-NA and high-slope spherical surfaces, aspheric surfaces and free-form surfaces.
Description
technical field [0001] The Mirau fluorescence interference micro-measurement device based on stimulated radiation belongs to the field of surface topography measurement technology, and particularly relates to a three-dimensional microstructure, micro-steps, and micro-grooves used in micro-structured optical components, micro-structured mechanical components, and integrated circuit components. Ultra-precise, dynamic, high-speed interferometry device for linewidth and large numerical aperture optical element surface shape measurement. Background technique [0002] Microscopic interferometry is to use the principle of light wave interference and microscopic magnification for surface measurement. With the rapid development of optoelectronic technology and computer technology, the phase shift technology that directly measures the interferometric phase distribution has been developed in the field of interferometry. The principle is: introduce a time modulation to the phase diffe...
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IPC IPC(8): G01B11/24
Inventor 刘俭谭久彬王伟波张拓
Owner HARBIN INST OF TECH
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