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Fluorescence interference microscopic measurement method and device based on stimulated radiation

A technology of interference microscopy and stimulated radiation, applied in measurement devices, optical devices, instruments, etc., can solve the problems of difficulty in returning probe light, and the detection system cannot achieve high NA and high slope surface detection.

Inactive Publication Date: 2015-09-23
HARBIN INST OF TECH
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] In order to solve the problem that it is difficult for the detection light to return to the detection system and thus cannot achieve high NA and high slope surface detection, the present invention discloses a fluorescence interference microscopic measurement method and device based on stimulated radiation

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  • Fluorescence interference microscopic measurement method and device based on stimulated radiation

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Embodiment Construction

[0022] The specific embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0023] The fluorescence interference microscopic measurement method based on stimulated radiation of the present embodiment comprises the following steps:

[0024] a, adopt the multi-source organic molecular beam deposition OMBD system, adopt the same process to vapor-deposit the organic thin film, vapor-deposit the same kind of fluorescent organic thin film with the same thickness on the surface of the test piece 10 and the reference mirror 7, and the test piece 10 The surface is changed from the original smooth surface to the diffuse surface;

[0025] b. The measured surface 10 and the reference mirror 7 are excited by the monochromatic detection laser, and the surface radiates quasi-monochromatic light with the same central wavelength and the same spectral width range. The central wavelength of the quasi-monochromatic light is 6...

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Abstract

The invention belongs to the technical field of surface topography measurement, and discloses a method and a device for fluorescence interference microscopic measurement based on stimulated radiation. The method includes: firstly, coating surfaces of a measured piece and a reference mirror; secondly, subjecting the measured piece and the reference mirror to stimulation of monochrome detection laser; and finally, resolving interference fringes on a detection surface. The device a laser device, a converging objective lens, a first pinhole, a collimation and beam expanding objective lens, a beam splitting prism, a reference focusing objective lens, the reference mirror, a displacement driver, a detection focusing objective lens, the measured piece, an imaging converging objective lens, a narrow-band filter, a second pinhole and a detector, wherein the converging objective lens, the first pinhole, the collimation and beam expanding objective lens, the beam splitting prism, the reference focusing objective lens, the reference mirror and the displacement driver are disposed on a direct light path of the laser device along a light transmitting direction, the detection focusing objective lens and the measured piece are disposed on a reflected light path of the beam splitting prism, and the imaging converging objective lens, the narrow-band filter, the second pinhole and the detector are disposed on a transmission light path of the beam splitting prism. By the design that surfaces of the measured piece and the reference mirror are coated by the aid of a vacuum evaporation coating method, measurement light is guaranteed to be capable of returning to a detection system after being reflected by a measured surface, high-NA(numerical aperture) and high-slope surface detection is achieved, and the device is applicable to ultra-precise measurement of three-dimensional topographies of high-NA and high-slope spherical surfaces, aspheric surfaces and free-form surfaces.

Description

technical field [0001] The fluorescence interference microscopic measurement method and device based on stimulated radiation belong to the field of surface topography measurement technology, in particular to a three-dimensional microstructure, microstep, and microgroove used in microstructured optical elements, microstructured mechanical elements, and integrated circuit elements. Ultra-precise, dynamic, high-speed interferometry method and device for groove line width and large numerical aperture optical element surface shape measurement. Background technique [0002] Microscopic interferometry is to use the principle of light wave interference and microscopic magnification for surface measurement. With the rapid development of optoelectronic technology and computer technology, the phase shift technology that directly measures the interferometric phase distribution has been developed in the field of interferometry. The principle is: introduce a time modulation to the phas...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/25
Inventor 刘俭谭久彬王伟波张拓
Owner HARBIN INST OF TECH
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