Fluorescence interference microscopic measurement method and device based on stimulated radiation
A technology of interference microscopy and stimulated radiation, applied in measurement devices, optical devices, instruments, etc., can solve the problems of difficulty in returning probe light, and the detection system cannot achieve high NA and high slope surface detection.
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[0022] The specific embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0023] The fluorescence interference microscopic measurement method based on stimulated radiation of the present embodiment comprises the following steps:
[0024] a, adopt the multi-source organic molecular beam deposition OMBD system, adopt the same process to vapor-deposit the organic thin film, vapor-deposit the same kind of fluorescent organic thin film with the same thickness on the surface of the test piece 10 and the reference mirror 7, and the test piece 10 The surface is changed from the original smooth surface to the diffuse surface;
[0025] b. The measured surface 10 and the reference mirror 7 are excited by the monochromatic detection laser, and the surface radiates quasi-monochromatic light with the same central wavelength and the same spectral width range. The central wavelength of the quasi-monochromatic light is 6...
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