The present application discloses a rotary self-cleaning
etching device, comprising a working room, a
dielectric cover, a carrier, a carrier, a coil, an inner cover, a rotary drive, a lifting drive and a lifting
assembly, wherein a shielding edge is provided at the bottom of the inner cover, which can prevent pollutants from entering the working room; a
soft metal film is attached to the surface of the inner cover, which can reliably and efficiently capture pollutants generated during the
etching process, thereby ensuring the cleanliness of the
etching environment and the effect of
wafer surface treatment; the rotating drive drives the carrier to rotate, which can improve the uniformity of
coating and etching; the lifting
assembly enables the inner cover to rotate with the carrier, which can avoid the inner cover and the
dielectric cover from sticking and the perforation from being blocked, and can also throw off pollutants with poor adhesion, thereby further ensuring the cleanliness of the environment in the cavity; a cleaning member is provided on the outer wall of the inner cover, which can rotate and clean the
dielectric cover by the cleaning member, and can also achieve self-cleaning of the
cavity wall, thereby reducing the need for stopping the
machine for unpacking.