Ion beam distribution

A technology of ion beam and ion sub-beam, applied in ion beam tube, ion implantation plating, vacuum evaporation plating, etc., can solve the problem of low efficiency of sputtering target use
CN103154309AActive Publication Date: 2013-06-12VEECO INSTR
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Applications(China)
Current Assignee / Owner
VEECO INSTR
Publication Date
2013-06-12

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Abstract

An ion beam system (100) includes a grid assembly (300) having a substantially elliptical pattern of holes to steer an ion beam (108) comprising a plurality of beamlets to generate an ion beam (108), wherein the ion current density profile (700, 900, 1100, 1200) of a cross-section of the ion beam (108) is non-elliptical. The ion current density profile (700, 900, 1100, 1200) may have a single peak that is symmetric as to one of the two orthogonal axes of the cross-section of the ion beam (108). Alternatively, the single peak may be asymmetric as to the other of the two orthogonal axes of the cross-section of the ion beam (108). In another implementation, the ion current density profile may have two peaks on opposite sides of one of two orthogonal axes of the cross-section of the ion beam (108).; Directing the ion beam (108) on a rotating destination work-piece (104) generates a substantially uniform rotationally integrated average ion current density at each point equidistant from the center of the destination work-piece (104).
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Description

[0001] Cross References to Related Applications

[0002] This application claims the benefit of priority to US Patent Application Serial No. 12 / 898,281, filed October 5, 2010, and entitled "Ion Beam Distribution," which is hereby incorporated by reference herein in its entirety. This application further claims U.S. Patent Application Serial No. 12 / 898,424, filed October 5, 2010, entitled "Plume Steering" and U.S. Patent Application No. 12 / 898,424, filed October 5, 2010, entitled "Grid Providing Beamlet Steering" priority to patent application Ser. No. 12 / 898,351, which is specifically incorporated herein by reference in its entirety. technical field

[0003] The present invention generally relates to ion beam systems and components thereof. Background technique

[0004] When an ion beam system is used to sputter material away from a target to create a coating on a substrate, the ion beam system may be referred to as an ion beam sputter deposition system. Alternatively, the...

Claims

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