Color microlens array and preparation method for same
A micro-lens array and color technology, applied in the optical field, can solve problems such as increasing the complexity of the system, and achieve the effects of reducing the loss of light energy, improving the imaging quality, and reducing the complexity and cost of the system
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Embodiment 1
[0055] Embodiment 1 of the present invention provides a method for preparing a color microlens array, see figure 1 , figure 2 , the method specifically includes the following steps:
[0056] Step 101: Provide a base.
[0057] Preferably, a piece of glass with high light transmittance and flat surface is used as the substrate 1 .
[0058] Specifically, the substrate was cleaned with water and acetone, and then placed in an oven and baked at 130°C for 10 minutes to remove water vapor and residual acetone; after baking, oxygen plasma treatment was performed to increase the surface energy of the glass. .
[0059] Preferably, the vacuum degree of the oxygen plasma treatment is 25Pa, the power is 60W, and the bombardment time is 90 seconds.
[0060] Step 102: Prepare a photoresist microlens array master on the substrate by hot-melt process.
[0061] Specifically, the positive photoresist 2 is spin-coated on the cleaned substrate, and after baking, the substrate with the photor...
Embodiment 2
[0084] Embodiment 2 of the present invention provides a color microlens array, see figure 2 , the microlens array includes another substrate 9 , red photoresist 10 and microlenses 12 which are sequentially stacked and connected.
[0085] Specifically, take another substrate 1, spin-coat a layer of red photoresist 10 with a certain thickness on the other substrate 1, and bake in a vacuum oven at 80° C. for 2 minutes to form a red photoresist substrate; The prepared polydimethylsiloxane (PDMS) soft stamp and the red photoresist substrate were preheated on a baking table at 90°C for 3 minutes; the polydimethylsiloxane (PDMS) soft stamp was pressed on the red On the photoresist, put a flat weight of 0.5kg on the polydimethylsiloxane (PDMS) soft seal, so that the polydimethylsiloxane (PDMS) soft seal is pressed into the softened red photoresist Medium; keep 90°C and heavy object pressure for 1 minute and then cool naturally; bake and cure the exposed red photoresist at 230°C for ...
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