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Method for implementing back polishing in crystalline silicon solar battery production

A solar cell, back-polishing technology, used in crystal growth, chemical instruments and methods, circuits, etc.

Active Publication Date: 2013-10-23
ZHEJIANG JINKO SOLAR CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Although the current wet etching can play a certain role in back polishing, its polishing effect still needs to be further improved. Therefore, it is urgent to invent a new process to further improve the back polishing effect of current wet etching. Complete

Method used

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Embodiment Construction

[0010] A method for realizing back polishing by wet etching, taking Kuttler equipment as an example, the specific implementation method is as follows: (1) Make a new design for the alkali tank of the etching equipment, and divide the alkali tank into two parts: a soaking area and a spraying area It is an independent part that can independently control the concentration and temperature of the lye, as well as other related hydration and addition of liquid medicine. Among them, the length of the tank body in the soaking area is 0.6m, and the length of the tank body in the spraying area is 0.2m. (2) The two tanks of the alkali tank are prepared according to a certain concentration: the concentration of alkali solution in the soaking area is 30%, and the concentration of alkali solution in the spraying area is 5%; the temperature in the soaking area is controlled at 50 ° C, and the temperature in the spraying area is 20 ℃. (3) After the silicon wafer passes through the etching tan...

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Abstract

The invention discloses a method for implementing back polishing in the crystalline silicon solar battery production. The method is characterized in that a new wet etched alkali tank structure is adopted and divided into two independent parts which are respectively a soaking zone and a spraying zone, wherein the two zones are provided with independent tank bodies and have independent control functions, and the control functions comprise the control on the concentration and the temperature of alkali liquor, water replenishing and liquid medicine addition; and a 'floating on water' manner is adopted in the soaking region of the alkaline tank for completing the back polishing through the corrosion of alkali liquor, and a spraying manner is adopted in the spraying zone of the alkaline tank for spraying the front surface and the back surface of a silicon wafer so as to remove porous silicon on the surface of the silicon wafer. The method can be used for realizing the goal of back polishing in the solar battery production under the condition that the front surface of the silicon wafer is not influenced, is simple to operate and has excellent effects.

Description

technical field [0001] The invention belongs to the field of manufacturing crystalline silicon solar cells, in particular to a method for realizing single-side back polishing in the production of silicon solar cells on wet etching equipment. Background technique [0002] In the production of conventional crystalline silicon solar cells, an aluminum back field is printed on the back of the cell to achieve passivation and improve the effect of back light reflectivity. If the back of the silicon wafer is polished before aluminum back field printing, a flat back surface can be formed, which is conducive to forming a more uniform back field and improving light reflectivity, thereby reducing the recombination of the back surface and increasing the spectral response, improving solar energy The conversion efficiency of the battery. [0003] Currently in silicon solar cells, backpolishing through a wet etch process is a good option. Taking Kuttler etching equipment as an example, t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10C23F1/40C23F3/00H01L31/18
CPCY02P70/50
Inventor 李茂林涂宏波王学林刘自龙李仙德陈康平金浩
Owner ZHEJIANG JINKO SOLAR CO LTD
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