Solar cell manufacture method

Abstract

A solar cell manufacture method is disclosed, comprising the steps of providing a silicon base plate which is provided with a first surface and a second surface which is arranged opposite to the first surface; arranging a patterned mask layer on the second surface of the silicon base plate; etching the silicon base plate and forming a plurality of three dimensional nanostructures which are bar-shaped protruding structures, wherein the cross section of each bar-shaped protruding structure is shaped like a bow; removing the patterned mask layer; forming a doped silicon layer on the surfaces of the three dimensional nanostructures and the surface of the silicon base plate among neighboring three dimensional nanostructures; providing an upper electrode and arranging the upper electrode on at least part of the surface of the doped silicon layer; providing a back electrode and arranging the back electrode on the first surface of the silicon base plate.

Description

technical field [0001] The invention relates to a preparation method of a solar cell. Background technique [0002] Solar energy is one of the cleanest energy sources today, inexhaustible and inexhaustible. The utilization of solar energy includes light energy-thermal energy conversion, light energy-electric energy conversion and light energy-chemical energy conversion. A solar cell is a typical example of light-to-electricity conversion, which is made using the photovoltaic principle of semiconductor materials. According to different types of semiconductor photoelectric conversion materials, solar cells can be divided into silicon-based solar cells, gallium arsenide solar cells, organic thin-film solar cells, and the like. [0003] At present, solar cells are dominated by silicon-based solar cells. A solar cell in the prior art includes: a back electrode, a silicon wafer substrate, a doped silicon layer and an upper electrode. In the solar cell, the silicon wafer substr...

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Problems solved by technology

[0004] However, the surface of the doped silicon layer prepared by the method for preparing solar cells in the prior art is a flat planar structure, and its surface area is relatively small. Therefore, the light-taking area of ​​the solar cell is relatively small.

In addition, when sunlight is incident on the surface of the doped silicon layer from the outside, a part of the light irradiated on the doped silicon layer is absorbed, a part is reflected, and the reflected light cannot be reused, so the solar cell is sensitive to light. low utilization

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