Vacuum cavity chamber capable of rapidly changing gas-homogenizing mode

A vacuum chamber and fast technology, applied in the field of vacuum chambers, can solve the problems of large impact on equipment, influence on substrate deposition, and high cost of transformation, and achieve the effects of improving reliability, improving uniformity, and reducing costs

Inactive Publication Date: 2013-12-04
CHINA UNIV OF GEOSCIENCES (BEIJING)
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In the existing vacuum experimental device, the air intake components of the air inlet and the space size of the vacuum experimental device are usually fixed, so the general experiment is only to adjust the flow rate and vacuum degree of gas delivery to find the best vacuum. However, in fact, the structural parameters of the vacuum chamber, such as the distance between the substrate and the air inlet, the structure of the air inlet nozzle, the size and area of ​​the air inlet, etc. will all affect the air intake mode, affecting the substrate deposition and other effects
However, the existing vacuum test device cannot adjust its structure and give a suitable structural scheme
In this way, in actual production, the structure, manufacture and operation methods and operating parameters of the equipment used cannot form a complete system, and it will happen that the operating methods and operating parameters obtained in the experiment are implemented in the actual equipment, and the experimental results cannot be obtained. The ideal result in the laboratory, sometimes the actual operation may get a completely substandard product
[0008] In actual equipment production, the gas uniformity method of each device is fixed, because it is difficult to test the chamber structure with different gas uniformity methods at the early stage of design, and to modify the equipment after it is formed, the cost of the transformation It will also be very high, and the transformation will have a great impact on the original equipment

Method used

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Embodiment Construction

[0052] The invention relates to a vacuum chamber capable of quickly replacing a uniform gas mode, which can be used for low-pressure gas phase processing technology experiments and detection of internal pressure parameters of the chamber. The air inlet and uniform air mode of this chamber can be changed quickly.

[0053] The vacuum chamber is a variable structure chamber, which consists of an air inlet nozzle 10, an upper cover 20, a first air distribution plate 30, a cavity, an inner lining 50, a second air distribution plate 60, a support plate 70, and a base 90 , The lifting device 100, the bellows 120, the throttle valve 140, the gas distribution system and the vacuum system.

[0054] Such as figure 1 As shown, the present invention relates to a vacuum chamber that can quickly replace the uniform air mode, which is a vacuum chamber including a cavity 40, an upper cover 20 and a lower cover 110, and an air inlet nozzle is provided on the upper cover 20 10. An air distribution s...

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Abstract

A vacuum cavity chamber capable of rapidly changing gas-homogenizing mode is a cavity comprising a cavity cylinder, a top cover (20), and a low cover. An air inlet nozzle (10) is arranged on the top cover (20), the air inlet nozzle is connected to a first cavity, which is arranged below the air inlet nozzle, to form a first air distribution chamber (160), the outer wall of the first air distribution chamber and the inner wall of the vacuum cavity form a second air distribution chamber (170), the cavity wall of the first air distribution chamber is provided with an air-distribution hole, which is used for communicating the first air distribution chamber and the second air distribution chamber; the cavity wall of the second air distribution chamber is provided with an air outlet, which is connected to a pipeline of a vacuum pump; the first cavity, which forms the first air distribution chamber, and the vacuum cavity form a detachable structure, the vacuum cavity is provided with a plurality of connecting structures, which are used for connecting to various sizes of connecting structures in the first air distribution chamber to construct a detachable structure. The vacuum cavity chamber can detect pressure parameters of inner space of lower cavity and every gas circuit in different air intake modes, researches the influencing rule of air flow parameters on technology during the production process of integrated circuit, and prominently improves the credibility of optimization design of air distribution components of IC equipment cavity.

Description

Technical field [0001] The invention relates to a vacuum chamber capable of quickly replacing a uniform gas mode, and particularly relates to a vacuum chamber that can be used for low-pressure gas phase processing technology tests and can be quickly replaced in a uniform gas mode. [0002] Background technique [0003] Integrated circuit manufacturing technology is a symbol of the comprehensive national strength of a country's economy, science and technology, military, etc., and has extremely important strategic significance in many fields such as national defense, aerospace, and information industry. One type of key process has very similar characteristics, that is, the gas phase processing process is carried out in a chamber with high cleanliness and low pressure. Mainly include: etching, plasma enhanced / chemical vapor deposition (PE / CVD), physical vapor deposition (PVD) and oxidation diffusion process. The common feature of these processes is that they need to be carried out i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455
Inventor 杨义勇刘伟峰程嘉季林红肖志杰
Owner CHINA UNIV OF GEOSCIENCES (BEIJING)
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