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A method for improving the damage threshold of fused silica optical elements

A technology of damage threshold and optical components, which is applied in the field of improving the damage threshold of fused silica optical components, can solve the problems of high cost, increase the damage threshold, and not have global processing of components, and achieve the effect of preventing redeposition and increasing the damage threshold

Active Publication Date: 2016-06-22
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, the polishing process requires strict control of the technology, and the cost is high. When the damage threshold reaches a certain height, it is difficult to increase the damage threshold by improving the polishing process.
However, laser preprocessing does not have the ability to globally process components because it belongs to point processing.

Method used

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  • A method for improving the damage threshold of fused silica optical elements

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] The chemical reagents, cleaning agents and ultrasonic equipment used in this embodiment are as follows:

[0023] Micro-90InternationalProductsCorporation

[0024] Etching solution = electronic grade HF: electronic grade NH 4 F:=1:2:4

[0025] Deionized water 18MΩ*cm

[0026] The ultrasonic cleaner is multiSONIK from Blackstone-NEY Ultrasonics TM generator seven-frequency ultrasonic cleaning machine, the frequency is 40kHz, 80kHz, 120kHz, 140kHz, 170kHz, 220kHz, 270kHz

[0027] Immerse the fused silica optical element to be processed in the micro-90: deionized water=1:10 cleaning solution for 30 minutes, rinse with deionized water for 30 minutes, spray for 5 minutes; then immerse in the etching solution for 5 minutes, Rinse with deionized water for 90 minutes, then spray for 30 minutes, and let it dry naturally. The above-mentioned cleaning, etching, and rinsing processes are all performed in a Class 1000 clean environment and a 40-270kHz ultrasonic cleaning machine, and the dr...

Embodiment 2

[0029] This embodiment is the same as embodiment 1, except that the etching time of the fused silica optical element in the etching solution is 60 minutes. The damage threshold test data is listed in Table 1 below.

Embodiment 3

[0031] This embodiment is the same as embodiment 1, except that the etching time of the fused silica optical element in the etching solution is 120 minutes. The damage threshold test data is listed in Table 1 below.

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Abstract

The invention provides a method for increasing the damage threshold of the fused silica optical element. The fused silica optical element is cleaned by a mixed solution of cleaning agent micro-90 and water, rinsed and sprayed; it is etched by hydrofluoric acid aqueous solution, rinsed and sprayed. Introduce 40kHz-270kHz multi-frequency ultrasonic cleaning throughout the cleaning process. The invention can effectively passivate the scratches in the subsurface damage layer of the fused silica element, remove polishing debris and polishing impurities in scratches of different scales, stabilize the hydrofluoric acid etching process, prevent the redeposition of etching by-products, and greatly Amplitude-stabilized boost element damage threshold.

Description

Technical field [0001] The invention belongs to the technical field of optical element processing, and in particular relates to a method for increasing the damage threshold of a fused silica optical element. Background technique [0002] Fused silica is the most commonly used optical material in large-scale high-power laser systems. Fused silica is widely used in optical systems to prepare optical elements such as lenses, windows, and shielding sheets. Under the action of strong laser, the fused silica optical element is easy to damage. When the total area of ​​the damage point exceeds a certain percentage, the fused silica optical element will be regarded as completely damaged and cannot be used. When the damage area of ​​the fused silica optical element in the US National Ignition Facility (NIF) is greater than 3%, the use of the fused silica optical element will be stopped. If a series of cleanings are carried out before the optical components are officially put into use, the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C15/00
Inventor 叶鑫蒋晓东黄进刘红婕孙来喜周信达王凤蕊周晓燕耿锋
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS