Coarse-fine motion integrated magnetic-levitation mask platform system

A mask stage, coarse and fine movement technology, applied in the field of lithography machine mask stage system, can solve the problems of increasing the burden of the underlying linear motor, limiting the movement accuracy of the mask stage, complex system structure, etc., achieving easy lightweight design, The effect of realizing lightweight design and simplifying the system structure
CN103454864AActive Publication Date: 2013-12-18TSINGHUA UNIV +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TSINGHUA UNIV
Publication Date
2013-12-18

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Abstract

The invention relates to a coarse-fine motion integrated magnetic-levitation mask platform system mainly applied to a photoetching machine. The system comprises a mask platform, a drive motor and a stander, wherein the drive motor is a moving-iron type magnetic-levitation planar motor, and permanent magnet arrays of the drive motor are connected with the mask platform, so that an active cell part of the mask platform system is formed; coil arrays of the drive motor are connected with the stander to form a stator part of the mask platform system. According to the coarse-fine motion integrated magnetic-levitation mask platform system, due to the drive motor, the six-degree-of-freedom movement of the mask platform system can be realized, and a planar grating ruler is taken as a measurement sensor of the mask platform system to carry out feedback measurement on the mask platform; the volume of the mask platform is reduced, meanwhile, the speed, the accelerated speed and the control bandwidth of the mask platform are improved, requirements of high moving accuracy and positioning accuracy are met, and then the production rate, the alignment precision and the resolution of the photoetching machine are improved.
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Description

technical field

[0001] The invention relates to a photolithography machine mask table system, which is mainly used in semiconductor photolithography machines and belongs to the technical field of semiconductor manufacturing equipment. Background technique

[0002] In the production process of integrated circuit chips, the exposure transfer (photolithography) of the design pattern of the chip on the photoresist on the surface of the silicon wafer is one of the most important processes. The equipment used in this process is called a photolithography machine (exposure machine). The resolution and exposure efficiency of the lithography machine greatly affect the characteristic line width (resolution) and productivity of the integrated circuit chip. As the key system of the lithography machine, the motion accuracy and work efficiency of the mask table system largely determine the resolution and exposure efficiency of the lithography machine.

[0003] The basic principle of step...

Claims

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