Coarse-fine motion integrated magnetic-levitation mask platform system

A mask stage, coarse and fine movement technology, applied in the field of lithography machine mask stage system, can solve the problems of increasing the burden of the underlying linear motor, limiting the movement accuracy of the mask stage, complex system structure, etc., achieving easy lightweight design, The effect of realizing lightweight design and simplifying the system structure

Active Publication Date: 2013-12-18
TSINGHUA UNIV +1
View PDF3 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When this stacked drive structure is in motion, the upper layer voice coil motor and its auxiliary structures and the mask table need to be driven by the bottom linear motor, which greatly increases the burden on the bottom linear motor. The system structure is complex and limits the movement of the mask table. accuracy, which hinders the improvement of its acceleration

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Coarse-fine motion integrated magnetic-levitation mask platform system
  • Coarse-fine motion integrated magnetic-levitation mask platform system
  • Coarse-fine motion integrated magnetic-levitation mask platform system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] The specific structure, mechanism and working process of the present invention will be further described below in conjunction with the accompanying drawings.

[0024] The present invention provides a maglev mask stage system with integrated coarse and fine movement, such as figure 1 and figure 2 As shown, the system includes a mask stage body 1, a drive motor and a frame 2. The mask stage body 1 is located in the middle of the mask stage system, and the mask stage body 1 is thin-walled The shell is made of silicon carbide ceramic material.

[0025] The drive motor of a kind of maglev mask table system with coarse and fine motion integrated in the present invention adopts a moving iron type maglev planar motor, (such as image 3 shown); there are two drive motors, each of which contains a coil array 5 fixed on the frame 2 and a permanent magnet array 4 fixed on the mask table body 1, which are symmetrically arranged between the mask table and the The direction of mov...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a coarse-fine motion integrated magnetic-levitation mask platform system mainly applied to a photoetching machine. The system comprises a mask platform, a drive motor and a stander, wherein the drive motor is a moving-iron type magnetic-levitation planar motor, and permanent magnet arrays of the drive motor are connected with the mask platform, so that an active cell part of the mask platform system is formed; coil arrays of the drive motor are connected with the stander to form a stator part of the mask platform system. According to the coarse-fine motion integrated magnetic-levitation mask platform system, due to the drive motor, the six-degree-of-freedom movement of the mask platform system can be realized, and a planar grating ruler is taken as a measurement sensor of the mask platform system to carry out feedback measurement on the mask platform; the volume of the mask platform is reduced, meanwhile, the speed, the accelerated speed and the control bandwidth of the mask platform are improved, requirements of high moving accuracy and positioning accuracy are met, and then the production rate, the alignment precision and the resolution of the photoetching machine are improved.

Description

technical field [0001] The invention relates to a photolithography machine mask table system, which is mainly used in semiconductor photolithography machines and belongs to the technical field of semiconductor manufacturing equipment. Background technique [0002] In the production process of integrated circuit chips, the exposure transfer (photolithography) of the design pattern of the chip on the photoresist on the surface of the silicon wafer is one of the most important processes. The equipment used in this process is called a photolithography machine (exposure machine). The resolution and exposure efficiency of the lithography machine greatly affect the characteristic line width (resolution) and productivity of the integrated circuit chip. As the key system of the lithography machine, the motion accuracy and work efficiency of the mask table system largely determine the resolution and exposure efficiency of the lithography machine. [0003] The basic principle of step...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 朱煜张鸣刘召杨开明徐登峰田丽张利秦慧超叶伟楠张金穆海华尹文生胡金春胡楚雄赵彦坡胡清平
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap