CMOS compatible silicon differential condenser microphone and method for manufacturing the same
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- GOERTEK MICROELECTRONICS CO LTD
- Publication Date
- 2014-02-05
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Abstract
Description
technical field
[0001] The invention relates to the technical field of microphones, in particular to a CMOS-compatible silicon differential capacitor microphone and a manufacturing method thereof. Background technique
[0002] Silicon-based MEMS microphones widely used in hearing aids, mobile phones, digital cameras and toys are reaching their limits. The need for smaller, cheaper, robust microphones with high sensitivity and low noise levels is endless. Reducing the size of a microphone degrades its performance, such as sensitivity. Today, however, micro-process technology provides very good control over the critical dimensions and characteristics of the microphone, enabling further miniaturization and optimization of the microphone. In addition, more complex MEMS microphone principles (such as a microphone with a differential capacitor and a differential preamplifier) ββcan be applied, so that the performance of the MEMS microphone (such as sensitivity) can be maintained...