Deplating solution for removing nickel on cooper surface, preparation method thereof, and method for removing nickel on cooper surface
A technology for stripping solution and copper surface, applied in stripping solution and its preparation, in the field of removing nickel on copper surface, which can solve problems such as harm to human body and affecting copper layer.
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[0021] As a preferred embodiment of the present invention, the content of each component in the stripping solution is:
[0022] Sulfuric acid 120-180g / L;
[0023] Hydrogen peroxide 80-150g / L;
[0024] Ethylenediamine 120-240g / L;
[0025] Cysteine 10-30g / L;
[0026] Sulfamic acid 3-7g / L.
[0027] The invention also provides a preparation method of the stripping solution, which comprises dissolving sulfuric acid, hydrogen peroxide, ethylenediamine, cysteine and sulfamic acid in water in proportion to form an aqueous solution.
[0028] Preferably, the sulfuric acid aqueous solution is prepared first, and then hydrogen peroxide, ethylenediamine and cysteine are sequentially added to the sulfuric acid aqueous solution to obtain a mixed system; the sulfamic acid is dissolved in water to form a sulfamic acid solution, and then the sulfamic acid solution is mixed with the mixed system to obtain the deplating solution.
[0029] Finally, the present invention provides a metho...
Embodiment 1
[0035] According to the following formula, first prepare sulfuric acid into an aqueous solution and sulfamic acid into an aqueous solution; then add hydrogen peroxide, ethylenediamine and cysteine to the sulfuric acid aqueous solution in sequence to obtain a mixed system; then mix the sulfamic acid aqueous solution with the mixed system Uniformly, obtain stripping solution S1, each component content is in this stripping solution S1: sulfuric acid 150g / L, hydrogen peroxide 100g / L, ethylenediamine 180g / L, cysteine 7g / L, sulfamic acid 5g / L L.
Embodiment 2
[0037] According to the following formula, first prepare sulfuric acid into an aqueous solution and sulfamic acid into an aqueous solution; then add hydrogen peroxide, ethylenediamine and cysteine to the sulfuric acid aqueous solution in sequence to obtain a mixed system; then mix the sulfamic acid aqueous solution with the mixed system Uniformly, obtain stripping solution S2, each component content is in this stripping solution S2: sulfuric acid 120g / L, hydrogen peroxide 90g / L, ethylenediamine 135g / L, cysteine 5g / L, sulfamic acid 3g / L L.
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