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Method and device for measuring temperature rising and heat resistance of Schottky grid field effect transistor

A Schottky gate, temperature rise technology, applied in the direction of single semiconductor device testing, material thermal development, etc., can solve problems such as affecting the acquisition temperature accuracy, gate voltage damage, burning devices, etc.

Active Publication Date: 2014-03-05
BEIJING UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, before the drain-source voltage is removed, the gate voltage starts to change from reverse bias to forward bias, which will damage or even burn the device.
However, if the conversion process is too slow, the temperature of the active area will drop, which will affect the temperature accuracy of the acquisition.
[0005] In the prior art, some adopt the fully open gate mode, and use the drain-source voltage and current to generate equivalent power to measure the temperature rise. For some devices that normally work under reverse bias, the result is not the temperature rise in the working state.

Method used

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  • Method and device for measuring temperature rising and heat resistance of Schottky grid field effect transistor
  • Method and device for measuring temperature rising and heat resistance of Schottky grid field effect transistor

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Embodiment Construction

[0039] Firstly, the device under test 401 is placed on a temperature-adjustable constant temperature platform 402, and the constant temperature platform can be formed by using a semiconductor refrigerator. The computer 100 is the center of the measurement, and the sending of measurement instructions, transmission and storage of measurement data are all controlled by the computer 100 . The computer 100 is connected to the FPGA unit 200 via USB. The FPGA unit 200 can use Altera Cyclone II EP2C8Q208C8N. The FPGA unit 200 is connected to the power module 300 . The power module 300 includes a gate voltage source 301 , a test current source 302 and a drain voltage source 303 .

[0040] The gate voltage source 301 can be constructed using OP07 and TIP42C. One terminal of the gate voltage source 301 is connected to the FPGA unit 200 and receives a gate voltage command set by the computer 100 . The other end of the gate voltage source 301 is connected to a state control switch 305 ...

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Abstract

The invention provides a method and device for measuring temperature rising and heat resistance of a Schottky grid field effect transistor and belongs to the technical field of semiconductor device measuring in the micro electronic technique. According to the method and device, a rapid selector switch controlled through control signals is designed; time delay converted from being negatively biased to being positively biased of grid voltage is cut off by drain-source voltage, and the time delay is accurately set and output by an FPGA control module; under a forward direction testing current, a steady-state process of Schottky junction voltage is related to capacitance of the device and the testing current value, the establishment process of the junction voltage at a constant-temperature is adopted to serve as constant-temperature reference junction voltage, and time delay errors of temperature rising under small computing operation are reduced; by adopting an FPGA, the functions of collecting and setting drain-source voltage, drain-source currents and gate-to-source voltage are designed, the function of feedback at the time less than a millisecond level can be achieved, and the device can be effectively protected against burning brought by vibration or misoperation.

Description

Technical field: [0001] The technology belongs to the field of semiconductor device measurement technology in microelectronic technology. The invention is mainly used in the measurement of the working temperature rise and thermal resistance of semiconductor Schottky junction devices (semiconductor GaAs, GaN and SiC MESFET power microwave devices). Background technique: [0002] Semiconductor devices, especially power semiconductor devices, will generate a lot of heat when they are working, causing the temperature of the active area of ​​the device to rise. This will accelerate the performance deterioration of the semiconductor device. For example, the working life is shortened and the performance of the device is deteriorated. The factors affecting the temperature rise of semiconductor devices are related to the heat generated when the device is working on the one hand; on the other hand, it is related to the heat dissipation characteristics of materials in each link durin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01R31/26G01N25/20
Inventor 冯士维邓兵岳元马琳郭春生
Owner BEIJING UNIV OF TECH
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