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Detachable nozzle and device for manufacturing atomic layer deposited film

A technology of atomic layer deposition and nozzle, applied in coating, metal material coating process, gaseous chemical plating, etc., can solve the problems of time-consuming, expensive, and inability to change the size parameters of the air inlet and air outlet, and achieve simplified operation effect of difficulty

Active Publication Date: 2014-03-12
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The size parameters of the gas inlet and the gas outlet play an important role in the process adjustment in the deposition experiment, and must be modified according to different needs. The existing devices for realizing the spatially isolated atomic layer deposition method cannot change the size of the gas inlet and the gas outlet. parameters, for different types of atomic layer deposition reactions, different devices need to be fabricated, which is expensive and time-consuming

Method used

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  • Detachable nozzle and device for manufacturing atomic layer deposited film
  • Detachable nozzle and device for manufacturing atomic layer deposited film
  • Detachable nozzle and device for manufacturing atomic layer deposited film

Examples

Experimental program
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Effect test

Embodiment 1

[0040] On the silicon wafer, deposit the Al2O3 film, the precursor A is trimethylaluminum, and the precursor B is H20.

[0041] For the reaction of the precursor, the detachable nozzle provided by the present invention is made of 316L stainless steel. The detachable spray head includes an air intake pipeline, an air inlet and an air outlet.

[0042] The air intake pipeline is a 1 / 4 inch swagelok (Swagelok) straight pipe or elbow pipe, and the inside of the air inlet is a trapezoidal cavity with a narrow top and a wide bottom, with an upper width of 6mm, a lower width of 30mm, and a height of 12mm , trapezoid angle 45 degrees. It is convenient for the gas to diffuse faster from the thinner pipeline to the larger structural cavity. The lower end of the inner cavity of the air inlet is rectangular with a size of 30*10mm. A cavity is formed inside the air outlet, the upper half of which has the same size as the lower end of the inner cavity of the air inlet, and the lower half o...

Embodiment 2

[0051] Alternately deposited on silicon wafers 2 o 3 film and TiO 2 film, precursor A is trimethylaluminum, precursor B is H 2 O, precursor C is titanium tetrachloride.

[0052] For the reaction of the precursor, the detachable nozzle provided by the present invention is made of 304 stainless steel. The detachable spray head includes an air intake pipeline, an air inlet and an air outlet.

[0053] The air intake pipe is a 1 / 4 inch swagelok (Swagelok) straight or bent pipe. The inside of the air inlet is a trapezoidal cavity with a narrow top and a wide bottom. The upper width is 6mm, the lower width is 30mm, and the height is 12mm. The included angle of the trapezoid is 45 degrees. It is convenient for the gas to diffuse faster from the thinner pipeline to the larger structural cavity. The lower end of the inner cavity of the air inlet is rectangular with a size of 30*10mm. A cavity is formed inside the air outlet, the upper half of which has the same size as the lower e...

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Abstract

The invention discloses a detachable nozzle and device for manufacturing an atomic layer deposited film. The nozzle for manufacturing the atomic layer deposited film comprises an air inlet pipeline, an air inlet and an air outlet, wherein the air inlet, as well as the air outlet, has a cavity therein, the cavity is formed inside the air outlet and is divided into an upper half part and a lower half part between which a funneled structure is arranged; the air inlet pipeline is fixedly connected with the air inlet; the air inlet and the air outlet is in demountable sealing connection. The device used for manufacturing the atomic layer deposited film comprises nozzles, a cavity support frame, a substrate carrying table and a motion platform, wherein a strip-shaped hollow part is formed in the middle of the cavity support frame, the detachable nozzles can be sequentially arranged in the hollow part; the substrate carrying table is arranged below a cavity support frame and is driven by the motion platform. The nozzle and the device are suitable for deposition reaction of different atomic layers, can be used for quickly and effectively manufacturing the atomic layer deposited layers through a gas separation atomic layers deposition method.

Description

technical field [0001] The invention belongs to the field of atomic deposition coating, and more specifically relates to a detachable nozzle and a device for making atomic layer deposition films. Background technique [0002] With the continuous development of semiconductor integrated circuits, the chip size is continuously reduced and the performance is continuously improved, and there is an urgent need for thin films with high precision and nanometer thickness. However, traditional thin film technologies such as chemical vapor deposition and physical vapor deposition are difficult to meet the increasingly stringent technical requirements. Atomic layer deposition technology has the characteristics of nano-controllable film thickness and good uniformity, and is widely used in micro-nano electronic devices, solar cells and other fields. A high-efficiency space-isolated atomic layer deposition technology is that the deposition reactions of two precursors occur independently i...

Claims

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Application Information

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IPC IPC(8): C23C16/455
Inventor 陈蓉何文杰褚波高玉乐单斌文艳伟
Owner HUAZHONG UNIV OF SCI & TECH
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