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A kind of textile, its production method and application

A production method and textile technology, applied in the field of textiles, can solve problems such as unevenness, wrinkles, and poor surface particle uniformity, and achieve the effects of smooth surface, uniform particle size, and improved UV resistance.

Inactive Publication Date: 2016-01-20
芜湖升星纺织品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The results of novelty searches of domestic and foreign patents and literature show that: magnetron sputtering films are more often made on glass or mica sheets; because textiles are relatively soft, direct sputtering on the surface of textiles will cause wrinkles and unevenness, which will affect the use; and co-sputtering Because the sputtering speed of each target is different, the uniformity of surface particles is relatively poor
Therefore, there have been no reports of sputtering films on soft textiles

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • A kind of textile, its production method and application
  • A kind of textile, its production method and application
  • A kind of textile, its production method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A method for fabricating fabrics, comprising the steps of:

[0027] A. The polypropylene cloth is cleaned and dried as the substrate, put into the magnetron sputtering device chamber, the reaction chamber is evacuated, and filled with high-purity argon as the reaction gas;

[0028] B. Use 99.99% metallic copper as the sputtering target;

[0029] C. Adjust the pressure to 0.5Pa, the power to 10W, and the gas flow rate to 20sccm, sputter a copper film on the polypropylene cloth substrate, and sputter for 5 minutes to obtain a polypropylene cloth with a single-layer copper film.

Embodiment 2

[0031] A method for fabricating fabrics, comprising the steps of:

[0032] A. The polypropylene cloth is cleaned and dried as the substrate, put into the magnetron sputtering device chamber, the reaction chamber is evacuated, and filled with high-purity argon as the reaction gas;

[0033] B. Use 99.99% metal copper as the target;

[0034] C. Adjust the pressure to 1Pa, the power to 20W, and the gas flow to 40sccm, sputter a copper film on the polypropylene cloth substrate, and sputter for 15 minutes to obtain a polypropylene cloth with a single-layer copper film.

Embodiment 3

[0036] A method for fabricating fabrics, comprising the steps of:

[0037] A. The polypropylene cloth is cleaned and dried as the substrate, put into the magnetron sputtering device chamber, the reaction chamber is evacuated, and filled with high-purity argon as the reaction gas;

[0038] B. Use 99.99% metallic copper as the sputtering target;

[0039] C. Adjust the pressure to 2Pa, the power to 30W, and the gas flow to 60sccm, and sputter a copper film on the polypropylene cloth substrate for 25 minutes to obtain a polypropylene cloth with a single-layer copper film.

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Abstract

The invention discloses a textile and a preparation method and application thereof. The surface of the textile provided by the invention is provided with a copper film and then a zinc oxide film in a sputtering manner, wherein the zinc oxide film is 40-80 nm thick and the copper film is 5-25 nm thick. The preparation method comprises the steps of sputtering the copper film on the textile through a magnetron sputtering method with the pressure of 0.5-2 Pa, the power of 10-30 W, the gas flow of 20-60 sccm and the sputtering time of 5-25 min; and sputtering the zinc oxide film with the gas flow of 20-60 sccm, the pressure of 0.5-2 Pa, the power of 50-100 W and the sputtering time of 20-40 min, thus obtaining the textile with a zinc oxide / copper layered composite film. Compared with an existing textile, the textile prepared by the invention is excellent in UV resistance, antistatic property and antibacterial property, and has wide application prospect in medicine and health, and industry fields.

Description

technical field [0001] The invention relates to the field of textiles, in particular to a textile, its manufacturing method and application. Background technique [0002] Sputtering is a phenomenon that occurs on the surface of a material. The phenomenon of bombarding the target surface with ions and bombarding the target atoms is called sputtering. The sputtered target atoms are deposited on the surface of the substrate to form a thin film. The principle of magnetron sputtering is that after the instrument is energized and started, firstly put the substrate into the vacuum chamber, then evacuate the vacuum chamber into a vacuum, then introduce gas such as argon, adjust to the required pressure, and turn on the voltage. At this time, the electrons Under the action of the electric field, it will move towards the substrate. During this process, the electrons will collide with the argon atoms. When the energy of the electrons is higher than the ionization energy of the argon at...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B32B15/20B32B9/00B32B27/02B32B27/32C23C14/35C23C14/18C23C14/08
Inventor 侯大寅魏安方吴家斌徐文正
Owner 芜湖升星纺织品有限公司