Solar cell manufacturing method and solar cell manufacturing system
A technology for solar cells and manufacturing methods, applied in electrical components, final product manufacturing, sustainable manufacturing/processing, etc., can solve problems such as inability to commercialize, reduce yield, and poor appearance of solar cells, and achieve reduced incidence, Excellent aesthetics and the effect of reducing poor appearance
Inactive Publication Date: 2016-01-20
MITSUBISHI ELECTRIC CORP
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- Description
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- Application Information
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Problems solved by technology
Therefore, there is a problem that a solar battery cell that does not satisfy the desired appearance quality is regarded as poor in appearance and cannot be commercialized, causing a decrease in yield.
Method used
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[0040] Figure 1-1 to Figure 1-3 It is a figure for explaining the structure of the solar cell 1 which concerns on embodiment of this invention, Picture 1-1 is a top view of the solar cell 1 viewed from the light-receiving surface side, Figure 1-2 is a bottom view of the solar cell 1 viewed from the side opposite to the light receiving surface, Figure 1-3 yes Figure 1-2 A cross-sectional view of main parts of the solar battery unit 1 along the direction A-A of FIG.
[0041] In solar cell 1 of this embodiment, n-type impurity diffusion layer 3 is formed by phosphorus diffusion on the light-receiving surface side of semiconductor substrate 2 made of p-type single crystal silicon, forming semiconductor substrate 11 having a pn junction. In addition, an antireflection film 4 made of a silicon nitride film (SiN film) is formed on the n-type impurity diffusion layer 3 . In addition, the semiconductor substrate 2 is not limited to a p-type single crystal silicon substrate, and...
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Abstract
It includes: a first step of forming a texture structure on both sides of a semiconductor substrate of the first conductivity type; a second step of measuring the reflectance distribution on both sides of the semiconductor substrate on which the texture structure is formed; a third step of forming a texture structure on both sides of the semiconductor substrate. An impurity diffusion layer in which an impurity element of the second conductivity type is diffused is formed on the side of the two surfaces of the semiconductor substrate on which the reflectance distribution is small; a light-receiving surface side electrode connected in a predetermined pattern; and a fifth step of forming a rear surface side electrode on the other side of the semiconductor substrate where the reflectance distribution is large.
Description
technical field [0001] The present invention relates to a solar cell manufacturing method and a solar cell manufacturing system, and more particularly to a solar cell manufacturing method and a solar cell manufacturing system excellent in appearance. Background technique [0002] Conventionally, bulk type (bulk type) solar cells have generally been produced by the following method. First, for example, a p-type silicon substrate is prepared as a substrate of the first conductivity type, and the damaged layer on the silicon surface that occurs when slicing from the cast ingot is removed by 10 μm to 20 μm with, for example, several to 20 wt % of caustic soda or carbonated caustic soda After thickening, anisotropic etching was performed with a solution obtained by adding IPA (isopropyl alcohol) to the same low-concentration alkali solution to form a texture so that the silicon (111) surface was exposed. [0003] Next, in for example phosphorus oxychloride (POCl 3 ), nitrogen, ...
Claims
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IPC IPC(8): H01L31/18H01L31/0236H01L31/068
CPCH01L31/02363H01L31/068H01L31/1804Y02E10/547H01L2924/0002Y02P70/50H01L2924/00H01L22/12
Inventor 唐木田昇市
Owner MITSUBISHI ELECTRIC CORP