Dielectric thin film current confinement vertical cavity surface emitting laser and manufacturing method thereof
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Embodiment 1
[0044] See attached figure 1 , attached figure 2 And attached image 3 , the dielectric thin film current confinement type vertical cavity surface emitting laser of the present invention comprises:
[0045] A substrate layer 6, the substrate layer 6 is a GaAs structure;
[0046] The N-type DBR layer 5 and the active layer 4 are sequentially grown on the upper end of the substrate layer 6, and the active layer 4 and the N-type DBR layer 5 form a cylindrical mesa;
[0047] Make the dielectric thin film current confinement layer 3 on the upper end of the cylindrical mesa formed by the active layer 4 and the N-type DBR layer 5 and the upper end of the substrate layer 6, and the dielectric thin film current confinement layer 3 on the upper end of the active layer 4 has a A current confinement window through which the active layer 4 is exposed, and the dielectric thin film current confinement layer 3 has a refractive index lower than 2.0 and a thermal conductivity higher than 50...
Embodiment 2
[0071] See attached Figure 5 The difference between the present embodiment and the first embodiment is that the current limiting window and the light output window are both of multiple circular structures.
Embodiment 3
[0073] See attached Figure 6 The difference between the present embodiment and the first embodiment is that the current limiting window and the light output window are polygonal structures.
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