Transmission optical component damage threshold improvement method based on multi-iteration etching

An optical element, iterative etching technology, applied in the coating and other directions, to achieve the effect of increasing the damage threshold, increasing the damage threshold, and being highly targeted

Active Publication Date: 2014-06-25
TONGJI UNIV
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Problems solved by technology

[0004] The purpose of the present invention is to provide a method for increasing the damage threshold of transmissive optical elements b

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  • Transmission optical component damage threshold improvement method based on multi-iteration etching

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Embodiment

[0049] Such as figure 1 As shown, a method for increasing the damage threshold of a transmission optical element based on multiple iterative etching, the method includes the following steps:

[0050] ①Firstly, the optical element is etched with hydrofluoric acid solution in an ultrasonic environment, and the etching depth is d 1 , and then rinse and spray with deionized water;

[0051] 11) The ultrasonic environment is 40kHz, 80kHz, 120kHz, 140kHz, 170kHz, 220kHz and 270kHz seven-frequency cycle vibration;

[0052] 12) The concentration of the hydrofluoric acid solution is 40%, the solution temperature is 60 degrees, the etching time is 5-30 minutes, and the etching depth is d 1 50-300 microns;

[0053] 13) The rinsing solution is deionized water, and the rinsing time is 30 minutes;

[0054] 14) The spraying solution is deionized water, and the spraying time is 10 minutes.

[0055] ②Use a ring polishing machine to polish the optical components, and the polishing removal d...

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Abstract

The invention relates to a transmission optical component damage threshold improvement method based on multi-iteration etching technology. The method comprises a step of using a high concentration hydrofluoric acid solution to carry out rapid etching of an optical element with an etching depth d1, a step of using an annular polishing machine to carry out rapid polishing on the optical element with a polishing removal depth d2, a step of baking the optical element in high temperature of 300 degrees and then using an ion source to carry out bombardment etching on the surface of the optical element with an etching depth d3, a step of carrying out low speed polishing processing with an polishing removal depth d4, and a step of using the ion source to carry out bombardment etching on the surface of the optical element again with an etching depth d5. Compared with the prior art, the method has the advantages of strong pertinence and good repeatability, through the multi-iteration etching, especially the successive decreasing removal depth and removal rate are employed, and the damage threshold of a transmission type optical element can be greatly enhanced.

Description

technical field [0001] The invention relates to the field of transmissive optical elements, in particular to a method for increasing the damage threshold of the transmissive optical element by using multiple etching techniques. Background technique [0002] Transmission optical components are key components in high-power laser systems, and the laser damage threshold of transmission optical components is one of the important bottlenecks that limit the development of high-power and high-energy laser technology. Compared with reflective optical components, transmissive optical components are more prone to damage under strong laser irradiation. The main reason is that optical components inevitably introduce various types of defects during optical cold processing such as cutting, grinding and polishing, such as nanoscale absorbing defects, micron-scale scratches, cracks and pits, etc. When the laser acts on these surface and subsurface defects, the strong absorption of the laser...

Claims

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Application Information

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IPC IPC(8): G02B1/11
Inventor 马彬陆梦蕾焦宏飞程鑫彬马宏平王占山
Owner TONGJI UNIV
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