Trapezoid metal dielectric film broadband pulse compressed grating

A metal medium, broadband pulse technology, applied in the direction of diffraction grating and so on

Inactive Publication Date: 2014-04-16
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As far as we know, no one has proposed a wide-spectrum, wide-angle spectrum metal

Method used

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  • Trapezoid metal dielectric film broadband pulse compressed grating
  • Trapezoid metal dielectric film broadband pulse compressed grating
  • Trapezoid metal dielectric film broadband pulse compressed grating

Examples

Experimental program
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Example Embodiment

[0027] Example 1:

[0028] A trapezoidal metal dielectric film broadband pulse compression grating used for a center wavelength of 800 nanometers is composed of a quartz substrate, a metal layer 8, a matching layer 7 composed of two dielectric films, and a trapezoidal grating ridge 4. The period of the trapezoidal grating 4 is 574.7 nm, the duty ratio is 0.43, the bottom angle of the grating ridge is 75°, and the outer layer is 1SiO 2 (Refractive index 1.45) thickness 100 nm, middle layer 2HfO 2 (Refractive index 1.96) layer thickness 149nm, inner layer 3SiO 2 The thickness is 57 nanometers. The outer layer 5 of the matching layer 7 is HfO 2 , The thickness is 119 nm; the inner layer 6 is SiO 2 , The thickness is 81 nanometers. The thickness of the gold layer 8 is 200 nm. Such as figure 2 When the incident angle is 53°, for 800 nm incident light, the grating TE has the highest diffraction efficiency of -1 order, which is greater than 97%, and in the wavelength range of 700-900 ...

Example Embodiment

[0029] Example 2:

[0030] A trapezoidal metal dielectric film broadband pulse compression grating used for a center wavelength of 800 nanometers is composed of a quartz substrate, a metal layer 8, a matching layer 7 composed of two dielectric films, and a trapezoidal grating ridge 4. The period of the trapezoidal grating 4 is 555 nm, the duty ratio is 0.27, the bottom angle of the grating ridge is 89°, and the outer layer 1 is SiO 2 (Refractive index 1.45) thickness 110 nanometers, intermediate layer 2 is TiO 2 (Refractive index 2.12) The layer thickness is 150 nanometers, the inner layer 3 is SiO 2 The thickness is 60 nanometers. The outer layer 5 of the matching layer 7 is TiO 2 , The thickness is 120 nm; the inner layer 6 is SiO 2 , The thickness is 80 nanometers. The thickness of the gold layer 8 is 150 nm. Such as Image 6 When the incident angle is 53°, the first order diffraction efficiency of the grating TE is the highest for 800 nm incident light, which is greater than...

Example Embodiment

[0031] Example 3:

[0032] A trapezoidal metal dielectric film broadband pulse compression grating used for a center wavelength of 800 nanometers is composed of a quartz substrate, a metal layer 8, a matching layer 7 composed of two dielectric films, and a trapezoidal grating ridge 4. The period of the trapezoidal grating 4 is 555 nm, the duty ratio is 0.62, the bottom angle of the grating ridge is 60°, and the outer layer 1 is SiO 2 (Refractive index 1.45) thickness 50 nanometers, intermediate layer 2 is TiO 2 (Refractive index 2.12) The layer thickness is 150 nanometers, the inner layer 3 is SiO 2 The thickness is 60 nanometers. The outer layer (5) of the matching layer 7 is TiO 2 , The thickness is 120 nm; the inner layer 6 is SiO 2 , The thickness is 80 nanometers. The thickness of the gold layer 8 is 100 nm. Such as Figure 8 When the incident angle is 53°, for 800 nm incident light, the first order diffraction efficiency of the grating TE is higher than 97%, and in the 700...

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Abstract

A trapezoid metal dielectric film broadband pulse compressed grating is characterized in that the grating is integrally formed through a matching layer and a trapezoid grating ridge, wherein the matching layer is composed of a quartz substrate, a metal layer and two layers of dielectric films, the trapezoid grating ridge is composed of three layers of dielectric films, and the outermost layer is made of SiO2. The cycle of the trapezoid grating is 490-640 nanometers, the duty ratio is 0.2-0.7, the base angle of the grating ridge is 60-89 degrees, the middle layer of the grating ridge is a high-refractive-index layer, and the inner layer and the outer layer of the grating ridge are low-refractive-index layers made of SiO2; the outer layer of the matching layer is a high-refractive-index layer, and the inner layer of the matching layer is a low-refractive-index layer; the thickness of the metal layer is larger than 50 nanometers. The trapezoid metal dielectric film broadband pulse compressed grating can be used as a pulse compressed grating of a high-power ultra-short pulse laser system with the central wavelength of 800 nanometers.

Description

technical field [0001] The invention relates to a high-power laser system, in particular to a trapezoidal metal dielectric film broadband pulse compression grating for a center wavelength of 800 nanometers. Background technique [0002] High-power ultrashort pulse lasers based on chirped pulse amplification have a wide range of application requirements in the fields of laser processing and research on the interaction between light and matter. Reflective gratings for stretching and compressing femtosecond laser pulses play an important role in chirped pulse amplification systems. A pulse compression grating must have as high a diffraction efficiency as possible, an anti-laser damage threshold and a sufficiently wide operating bandwidth. The earliest pulse compression grating is a gold-plated grating, which has a relatively wide operating bandwidth, but it is difficult to obtain high diffraction efficiency and anti-laser damage threshold due to its strong absorption character...

Claims

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Application Information

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IPC IPC(8): G02B5/18
Inventor 晋云霞关贺元刘世杰易葵邵建达
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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