A kind of anti-radiation nanoporous membrane

A nano-porous, radiation-resistant technology, applied in reactors, shielding, nuclear engineering, etc., can solve problems such as inability to release, and achieve the effects of reducing defect concentration, improving anti-radiation swelling, and excellent anti-radiation swelling

Active Publication Date: 2016-06-29
WUHAN UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Existing radiation-resistant materials can absorb defects caused by irradiation and cannot release defects

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of anti-radiation nanoporous membrane
  • A kind of anti-radiation nanoporous membrane
  • A kind of anti-radiation nanoporous membrane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Using the single crystal Si (100) cleaned by RCA method as the substrate, the SiO on the Si surface was cleaned 2 Oxide layer and some impurities. The anti-radiation nano film is deposited by magnetron sputtering. Before deposition, the temperature of the substrate was room temperature. During the deposition process, pure Ar, N 2 , the flow rates are fixed at 5sccm and 20sccm respectively. The target power is 150W when depositing the nanoporous CrN film. After the deposition time reaches 8000s, a nanoporous CrN film with a uniform thickness of about 450nm is formed. During the whole process of reactive magnetron sputtering, the sample stage rotates on the same plane to maintain the uniformity of the long film.

[0021] Analyze the sample prepared in this embodiment, figure 1 (a) is the cross-sectional transmission electron micrograph and the corresponding plane and cross-sectional scanning electron micrograph of the nanoporous CrN thin film prepared by this exampl...

Embodiment 2

[0023] Deposit a V thin film on a silicon substrate with a sputtering power of 150W and a film thickness of 450nm. With 40keVHe + Ions were irradiated with a dose of 1×10 17 ions / cm 2 . The peak concentration of He is 5 at.%, and the peak displacement damage is 9 dpa. It can be seen from Figure (3) that only helium bubbles with a size smaller than 1nm appeared in the sample after high-dose irradiation. The existence of nanopores greatly inhibited the growth of helium bubbles and greatly improved the radiation resistance of the material.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an irradiation resistance nano-porous membrane, and belongs to the application field of advanced nuclear energy materials. The irradiation resistance nano-porous membrane comprises longitudinal nano-hole channels penetrating through the surface, the diameter of each longitudinal nano-hole channel is larger than 2 nanometers, the distance between every two adjacent longitudinal nano-hole channels is smaller than the scattering distance of interstitial atoms and the He gas, and branch-shaped nano-hole channels are transversely formed in each longitudinal nano-hole channel. The abundant hole channels of the nano-porous membrane can absorb the interstitial atoms, vacancies, transmutation gas and other flaws produced by irradiation and can also release gas atoms out of a material, the flaw content inside the material can be greatly reduced, the interstitial atoms, the vacancies and the transmutation gas are prevented from being gathered to form an atomic cluster, a cavity, bubbles and the like, and the radiation swelling resisting capability, the hardening resisting capability and the non-crystallizing capability of the material are greatly improved.

Description

technical field [0001] The invention belongs to the field of nuclear energy application, and in particular relates to a radiation-resistant nanoporous membrane. Background technique [0002] Nuclear energy is one of the most effective solutions to the world's growing energy needs today. The most critical issue at present is to find nuclear reactor materials that are resistant to radiation, corrosion, and high temperature. [0003] In a nuclear reactor, neutron transmutation, alpha decay, occurs, which creates a large number of defects. The accumulation of defects will lead to swelling, hardening, amorphization, embrittlement, creep, etc. of the material, which will change the original mechanical and thermal properties of nuclear power plant components, seriously affecting their performance and life. In addition to the high off-site damage rate and He production rate brought by 14 MeV neutrons, structural materials and plasma-facing materials in fusion reactor equipment mus...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G21F1/00
Inventor 任峰洪梦庆张红秀秦文静刘丹肖湘衡蒋昌忠
Owner WUHAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products