A kind of anti-radiation nanoporous membrane
A nano-porous, radiation-resistant technology, applied in reactors, shielding, nuclear engineering, etc., can solve problems such as inability to release, and achieve the effects of reducing defect concentration, improving anti-radiation swelling, and excellent anti-radiation swelling
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0020] Using the single crystal Si (100) cleaned by RCA method as the substrate, the SiO on the Si surface was cleaned 2 Oxide layer and some impurities. The anti-radiation nano film is deposited by magnetron sputtering. Before deposition, the temperature of the substrate was room temperature. During the deposition process, pure Ar, N 2 , the flow rates are fixed at 5sccm and 20sccm respectively. The target power is 150W when depositing the nanoporous CrN film. After the deposition time reaches 8000s, a nanoporous CrN film with a uniform thickness of about 450nm is formed. During the whole process of reactive magnetron sputtering, the sample stage rotates on the same plane to maintain the uniformity of the long film.
[0021] Analyze the sample prepared in this embodiment, figure 1 (a) is the cross-sectional transmission electron micrograph and the corresponding plane and cross-sectional scanning electron micrograph of the nanoporous CrN thin film prepared by this exampl...
Embodiment 2
[0023] Deposit a V thin film on a silicon substrate with a sputtering power of 150W and a film thickness of 450nm. With 40keVHe + Ions were irradiated with a dose of 1×10 17 ions / cm 2 . The peak concentration of He is 5 at.%, and the peak displacement damage is 9 dpa. It can be seen from Figure (3) that only helium bubbles with a size smaller than 1nm appeared in the sample after high-dose irradiation. The existence of nanopores greatly inhibited the growth of helium bubbles and greatly improved the radiation resistance of the material.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com