Cleaning trough body structure for photoresist nozzle and application of cleaning trough body structure

Abstract

The invention relates to a cleaning trough body structure for a photoresist nozzle and application of the cleaning trough body structure. The cleaning trough body structure comprises a cleaning trough shell, a cleaning fluid anti-splattering cavity, a nozzle cleaning cavity, a cleaning fluid discharging opening, a cleaning fluid pipeline, a newly-added cleaning fluid pipeline, a nitrogen purging pipeline and a negative pressure exhaust pipeline, wherein a cleaning fluid flows to the inner lower part of the nozzle cleaning cavity along the cleaning fluid pipeline and the newly-added cleaning fluid pipeline for washing a nozzle head so that the nozzle head is completely cleaned; the nitrogen purging pipeline and the negative pressure exhaust pipeline which are arranged in an inclined manner can be used for reducing frequency of the condition that the cleaning fluid splashes to the cleaning fluid anti-splattering cavity, and can prevent the cleaning fluid or final cleaning fluid from remaining inside the nozzle cleaning cavity. According to the cleaning trough body structure and the application thereof, disclosed by the invention, cleaning effect on the nozzle head can be ensured, residual of pollutants can also be prevented, and the light resistance spraying quality of the photoresist nozzle is not influenced.

Description

technical field [0001] The invention relates to the technical field of integrated circuit manufacturing, in particular to a cleaning tank structure and application of a photoresist nozzle of a photolithography glue coating machine. Background technique [0002] At present, a photolithography coating machine is widely used in the field of integrated circuit manufacturing. After the photolithography coating machine is used, foreign matter will adhere to its nozzle. Cleaning; the structure of the photoresist nozzle cleaning tank of the photolithography coating machine currently used is as follows: figure 1 As shown, among them, 1 is the root of the nozzle, 2 is the waist of the nozzle, 3 is the head of the nozzle, 4 is the anti-cleaning liquid splash chamber, 5 is the shell of the cleaning tank, 6 is the final cleaning nozzle, 7 is the cleaning liquid pipeline, 8 is the cleaning liquid discharge port, 9 is the nozzle cleaning chamber; the cleaning liquid pipeline passes throug...

AI Technical Summary

Problems solved by technology

[0008] 1) A single cleaning liquid pipeline cannot fully clean the surroundings of the nozzle head, and the nozzle head will still have pollutants attached;

[0009] 2) Prolonging the cleaning time of the photoresist nozzle in the cleaning tank takes up more process time, and it cannot ensure that the pollutants around the nozzle head are cleaned;

[0010] 3) Increasing the diameter of the cleaning liquid pipeline and increasing the flow rate of the cleaning liquid will not only cause the cleaning liquid to splash to the nozzle waist and flow down to the nozzle head to affect the cleanliness of the nozzle head, but also cause waste of cleaning liquid. Increased material costs on site;

[0011] 4) When the photoresist nozzle moves out of the cleaning tank, due to the surface tension of the liquid, the cleaning liquid containing pollutants will adhere to the nozzle head and be carried out by the photoresist nozzle, thereby affecting the quality of the photoresist nozzle when spraying photoresist ;

[0012] 5) The cleaning liquid or final cleaning liquid remaining in the nozzle cleaning chamber will bring pollutants to the nozzle head of the next photoresist nozzle, affecting the cleaning effect of the next photoresist nozzle

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