Imaging spectrometer based on multi-level micro reflecting mirror and manufacturing method thereof
An imaging spectrometer and micro-mirror technology, which is applied in the field of remote sensing observation of the earth, can solve the problems of limiting the luminous flux of the system, achieve the effect of solving the low signal-to-noise ratio of the system, increasing the luminous flux, and improving the reliability
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
specific Embodiment approach 1
[0036] Specific implementation mode 1. Combination figure 1 and figure 2 Describe this embodiment, the imaging spectrometer based on the multistage micro-mirror, the imaging spectrometer is composed of a pre-imaging system 1, an interference system 2, a post-imaging shrinking system 3 and an infrared CCD4. Among them, the interference system 2 is composed of a multi-level stepped micro-mirror 7, a plane mirror 5, a sheet beam splitter 6 and a compensation plate 8; at a certain moment, the light emitted by the ground target object enters the imaging spectrometer system at a certain field of view , after passing through the pre-imaging system 1 and the sheet beam splitter 6, the images are respectively imaged on a stepped surface of the plane mirror 5 and the multi-step micro-mirror 7 . Wherein the different reflective surfaces of the multi-level stepped micro-mirror 7 correspond to images formed in a certain field of view range of ground objects, and are imaged on a certain r...
specific Embodiment approach 2
[0045] Specific embodiment two, combine Figure 3 to Figure 5 Describe this embodiment, this embodiment is the manufacturing method of the imaging spectrometer based on the multistage micro-mirror described in specific embodiment 1, this method is realized by the following steps:
[0046] a. Make the base of the imaging spectrometer, choose aluminum, copper, titanium, stainless steel or silicon as the base material, make the base material according to the designed size requirements, and polish the upper surface; the roughness of the polished surface is less than Equal to 10 microns, flatness less than or equal to 50 microns.
[0047] b. Taking the center position of the substrate as the center position of the transflective and transflective surface of the sheet beam splitter 6, the relative positions of the four optical axis reference lines using the refractive index and thickness data of the sheet beam splitter 6 and the compensation plate 6 And the position of the micro-adj...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Roughness | aaaaa | aaaaa |
| Flatness | aaaaa | aaaaa |
| Height | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com
