A cathode device for a vacuum coating production line

A technology of vacuum coating and production line, applied in vacuum evaporation coating, sputtering coating, ion implantation coating, etc. Low material utilization rate and other issues, to achieve the best coating stability and uniformity, simple structure, and improve the effect of utilization
CN104018129BActive Publication Date: 2016-03-09XIANGTAN HONGDA VACUUM TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
XIANGTAN HONGDA VACUUM TECH CO LTD
Publication Date
2016-03-09

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Abstract

The invention discloses a cathode device for a vacuum coating production line, comprising a cathode assembly and a translation assembly, the cathode assembly is fixedly connected to the translation assembly and moves in translation with the movement of the translation assembly, wherein the cathode in the cathode assembly is a plane Magnetron sputtering cathode. Compared with the prior art, the cathode device provided by the present invention can not only maintain the advantages of low cost and easy maintenance of the planar cathode, but also realize the advantages of variable target and bombardment orbit of the rotating cathode, and realize the additional components of translation The structure is simple, it will not affect the vacuum sealing, and it will not become an uncertain factor in the production line; therefore, the cathode device has great economic value, is environmentally friendly, and reduces the waste of the target, so its application prospect is very good broad.
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Description

technical field

[0001] The invention relates to the technical field of a vacuum coating production line, in particular to a cathode device for a vacuum coating production line. Background technique

[0002] Vacuum coating is a technology that prepares a film layer in a vacuum to produce a thin film material. Specifically, the atoms of the material in the vacuum chamber are separated from the heating source and hit the surface of the object to be plated, including plated crystalline metals, semiconductors, and insulators. Elemental or compound membranes. Although chemical vapor deposition also uses vacuum methods such as decompression, low pressure or plasma, vacuum coating generally refers to the deposition of thin films by physical methods. There are three forms of vacuum coating, namely evaporation coating, sputtering coating and ion plating.

[0003] Sputtering coating is the most important method in vacuum coating. This technology uses energetic particles to bombard th...

Claims

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