An in-situ mask changing device and an application method thereof

Abstract

The invention relates to an in-situ mask changing device. The device comprises a movable mask plate support. At least two openings are formed on the mask plate support. A mask plate is placed in each opening. A movable substrate movement drive device is arranged beside the mask plate support. The substrate movement drive device is detachably connected with a substrate matching with each mask plate. The substrate movement drive device can push the substrate into the openings and in contact with the mask plates. The substrate movement drive device can further drive the substrate away from the openings. The in-situ mask transforming device can be applied to a vacuum chamber, realize the change of the mask plates in a vacuum environment, and efficiently avoid pollution to the sample. In addition, the device further suppresses the shadow effect caused by the mask plates in the preparation process and guarantees the film quality. The invention further relates to an application method of the in-situ mask changing device. The method can realize automatic change of the mask plates in a preparation environment, save the change time of the mask plates and improve the preparation efficiency. Moreover, the operation is more convenient.

Description

technical field [0001] The invention relates to the technical field of preparation of high-throughput combined materials, in particular to an in-situ mask switching device and a method for using the same. Background technique [0002] In 2011, the United States and the European Union proposed the "Materials Genome Initiative (MGI)" (Materials Genome Initiative, MGI) and the "Accelerated Metallurgy" (Accelerated Metallurgy, ACCMET) science plan, and China also held the Xiangshan Science Conference at the end of 2011 by the Chinese Academy of Sciences and the Chinese Academy of Engineering. Discuss coping strategies. In 2012, a major consulting project of the Chinese version of the Materials Genome Project was launched, and strategic planning and implementation recommendations were formed in 2014. The above-mentioned scientific plans all emphasize the important role of high-throughput combined material research methods in accelerating the process of material research and devel...

AI Technical Summary

Problems solved by technology

In order to overcome the shortcomings of time-consuming mask replacement and easy sample contamination in the traditional high-throughput combined thin film materials and device preparation process, Samuel S.Mao proposed the use of in-situ masking in the article "High throughput growth and characterization of thin film materials". The template replacement device replaces the masks stored in stacks by rotating, which can effectively avoid the contamination of samples and masks, and can also effectively avoid damage to the vacuum environment and improve the preparation efficiency. Large voids can easily cause shadow effects and affect sample quality

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