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170results about How to "Reduce shadowing effect" patented technology

Organic light-emitting display panel and display apparatus

The invention discloses an organic light-emitting display panel and a display apparatus. The organic light-emitting display panel comprises a display area and a non-display area, wherein the display area comprises a substrate, a driving circuit layer and an light-emitting device layer disposed on the driving circuit layer; and the non-display area comprises a retaining wall arranged to encircle the display area, the retaining wall comprises at least one support layer, a barrier layer disposed on the support layer and multiple projections formed on the barrier layer, and the multiple projections are successively arranged along a direction away from the display area. The organic light-emitting display panel further comprises a packaging layer which covers the display area and the surfaces of a part of the projections. According to the invention, through designing the multiple projections at the top end of the retaining wall, the edge of the packaging layer can be sealed only by use of one retaining wall, the frame width of the display panel is reduced, the multiple projections generate deformation to make up for slits when being extruded by a mask, through the multiple projections, diffusion paths of reaction gas during deposition are also increased, diffusion can be ended in the multiple projections, and a shadow effect is eliminated.
Owner:SHANGHAI TIANMA MICRO ELECTRONICS CO LTD

Low-profile solar tracking module

An apparatus for distribution of light across a target area has at least one non-shadowing lens. The non-shadowing lens has a plurality of prisms wherein each prism provides an approximately uniform distribution of light across a defined area of the target area to reduce a shadowing effect. The apparatus may further have a tracking mechanism attached to the at least one non-shadowing lens for orienting the at least one non-shadowing lens towards a source of the light.
Owner:3T SOLAR

Visual Shields With Technology Including Led Ladder, Network Connections and Concertina Effects

A LED ladder system (650) includes strip units (674) with spaced apart LED elements. Network connection configurations (810, 850, 856, 868) receive AC power and selectively apply DC power to the strip units (674) based on control signals. A concertina visual shield configuration (902) is positioned adjacent the ladder system (650) to affect visual lighting properties.
Owner:SKIDMORE MARSHA +5

Wafer-level aca flip chip package using double-layered aca/nca

A method of manufacturing a wafer-level flip chip package is capable of being used to produce a flip chip package by directly coating a flip chip package using anisotropic conductive adhesives (ACA) and non conductive adhesives (NCA) in a solution state as a double layer on a wafer. The method can be used to manufacture a non-conductive mixed solution and a conductive mixed solution and directly coat them on a substrate, such that it is possible to: increase productivity; simplify a manufacturing process; suppress a shadow effect; easily perform thickness control that is difficult with the anisotropic conductive adhesive paste or the non-conductive adhesive paste; and obtain the non-conductive layer and the anisotropic conductive layer in an initial state of a B-stage with a level not losing latent of hardening through a simple drying process to volatilize an organic solvent. Above all, the non-conductive layer and the anisotropic conductive layer is sequentially stacked on the substrate formed with the non-solder bump, making it possible to make the selectivity of electrical conduction and the stability of a connection process excellent, shorten process time and costs, and dramatically reduce consumption of the conductive particles which account for a large portion of total production costs.
Owner:KOREA ADVANCED INST OF SCI & TECH

Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method

ActiveUS20190384157A1Fine and highly accurate absorber patternStable cross-sectional shapePhotomechanical apparatusSemiconductor/solid-state device manufacturingLithographic artistShadow effect
Provided are a reflective mask blank and a reflective mask, which are able to reduce the shadowing effects of EUV lithography and form a fine pattern. As a result, a semiconductor device can be stably manufactured with high transfer accuracy. The reflective mask blank comprises a multilayer reflective film and an absorber film in that order on a substrate, and the absorber film comprises a material comprising an amorphous metal comprising at least one or more elements among cobalt (Co) and nickel (Ni).
Owner:HOYA CORP

Method and Device for Bone Scan in Meat

InactiveUS20170205385A1Increase probabilityMinimizes and eliminates specular reflectanceAnalysing solids using sonic/ultrasonic/infrasonic wavesRaman scatteringForeign matterUltrasound Identification
A method and device for detection of bone in meat identifies fragments larger than about 1 mm using spectral optical imaging and ultrasound. Spectral imaging can detect foreign material proximate to the surface and ultrasound can detect material within the sample. The sample is irradiated by light and reflected light or Raman scattered light measured. The sample is similarly irradiated by ultrasound and reflected or transmitted sound waves give a set of amplitude data points, which include temporal delay. These data points are then processed by statistical methods to derive a set of vectors in n-dimensional space, which are compared to a calibrated data set of derived vectors which have distinct identifying loci for each type of surface, are indicative of the presence or absence of defects.
Owner:7386819 MANITOBA LTD

Method and apparatus for providing a rolling double reset timing for global storage in image sensors

An apparatus for and a method of operating an array of pixels of an image sensor, where each pixel includes at least a photosensor, an associated storage device and a floating diffusion region and the array of pixels is configured in a plurality of rows and columns. The photosensors associated with the pixels are reset and charges are accumulated in the photosensor. The accumulated charges are then globally transferred to storage devices associated with the pixels. A rolling double reset is used to reduce the deleterious effects on the accumulated charges stored in the storage devices. The accumulated charges stored in the storage devices are transferred to floating diffusion regions associated with the pixels and the charges residing in the floating diffusion region are read out. In a second embodiment the storage device is eliminated and the rolling double reset is used to reduce the deleterious effects on the accumulated charges stored in the floating diffusion region.
Owner:APTINA IMAGING CORP

Mask plate and encapsulating method for OLED device

The invention provides a mask plate and an encapsulating method for an OLED device. According to the mask plate provided by the invention, a plurality of rectangular shielding parts are uniformly arranged on four sides of a rectangular opening of a frame body; when the mask plate is utilized to encapsulate the OLED device, three independent sides of the rectangular shielding parts generate shadow effects, so that film thickness of a passivation layer formed below the rectangular shielding parts is the same as that of a passivation layer formed below a residual un-shielded area in the rectangular opening; moreover, positions on which the rectangular shielding parts are connected with the sides of the rectangular opening do not generate shadow effects, and the shadow effect generated by a bottom side of a first groove between adjacent two rectangular shielding parts is diffused towards the positions on which the adjacent rectangular shielding parts are connected with the sides of the rectangular opening for being diluted and reduced, so that the shadow effects of the side integers of the rectangular opening is reduced, and an actual film-forming area of the passivation layer is almost the same as a preset designed film-forming layer, and therefore, a narrow side frame design can be realized, encapsulating effect is improved, and the service life of the device is prolonged.
Owner:WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD

Method for reducing interference of ground and isolation belt on automobile millimeter wave radar

The invention relates to a method for reducing the interference of the ground and an isolation belt on an automobile millimeter wave radar. The method includes the following steps that: step 1, transmission signals are emitted, and return signals are generated when the transmission signals meet an object; step 2, the return signals are received; step 3, frequency mixing is performed on the returnsignals and local oscillation signals, so that intermediate-frequency signals can be outputted; step 4, distance fast Fourier transformation and Doppler fast Fourier transformation are separately performed on the intermediate-frequency signals; step 5, the distance-Doppler two-dimensional spectrum of the intermediate-frequency signals is obtained; step 6, distance dimension information and speed dimension information at a target position are extracted from the distance-Doppler two-dimensional spectrum, and the distance dimension information is subjected to constant false alarm processing by using a sorting method; step 7, a unit average method is adopted to perform constant false alarm processing on the speed dimension information which has been subjected to sorting method-based constant false alarm processing, so that the detection threshold value of the target position can be obtained; step 8, a final detection threshold value is obtained according to a set false alarm probability; step 9, the peak values of the target position are compared with the final detection threshold value; and step 10, whether a target object exists in the target position is judged.
Owner:米传科技(上海)有限公司

Light scattering euvl mask

A light scattering EUVL mask and a method of forming the same comprises depositing a crystalline silicon layer over an ultra low expansion substrate, depositing a hardmask over the crystalline silicon layer, patterning the hardmask; etching the crystalline silicon layer, removing the hardmask, and depositing a Mo / Si layer over the crystalline silicon layer, wherein etched regions of the crystalline silicon layer comprise uneven surfaces in the etched regions. The method further comprises depositing a photoresist mask over the hardmask, creating a pattern in the photoresist mask, and transferring the pattern to the hardmask. The Mo / Si layer comprises uneven surfaces conformal with the sloped surfaces of the crystalline silicon layer, wherein the sloped surfaces of the Mo / Si layer may be configured as roughened, jagged, sloped, or curved surfaces, wherein the uneven surfaces deflect incoming extreme ultraviolet radiation waves to avoid collection by exposure optics and prevent printing onto a semiconductor wafer.
Owner:GLOBALFOUNDRIES INC

Optical arrangement and a microscope

An optical arrangement in a microscope, comprising an illumination device for generating an illumination light beam (1), running on an illumination side, a splitting device (2) for splitting the illumination light beam (1) into at least two partial beams (3, 4), and a mirror arrangement (5) for reflecting the partial beams (3, 4) into an illumination region (6) for plane illumination of a sample (7), with regard to flexible application with structurally simple means, is characterized by a detection optical unit (8) arranged on that side of the illumination region (6) which faces away from the illumination side. A microscope comprising a corresponding optical arrangement is furthermore specified.
Owner:LEICA MICROSYSTEMS CMS GMBH

Casting mold for producing high-temperature alloy single crystal blades and directional solidification device thereof

The invention provides a casting mold for producing high-temperature alloy single crystal blades. The casting mold is applied to a directional solidification device. The casting mold is in a cylindrical shape and comprises an inner-layer ceramic shell and an outer filling interlayer, wherein an inner cavity formed by the ceramic shell is used for pouring high temperature alloy melts to form high-temperature alloy castings, and the periphery of the ceramic shell is filled with heat conduction materials and thermal insulation materials alternately through a barrel-shaped hoarding to form a filling entity provided with a plurality of horizontal heat conduction layers and thermal insulation layers through bonding. According to the entity heat conduction casting mold process, pouring and directional solidification can be performed in the existing directional solidification furnace, all sides of blades can be evenly heated, and therefore the severe shadow effect and organizational defects caused by the shadow effect can be eliminated effectively; and the condition that cold and hot areas in the existing device are almost through is changed, closed isolation between hot areas and cold areas is achieved, reduction of heat losses is facilitated, temperature gradients in castings is increased greatly, and the optimal temperature condition for growth of single crystals is formed.
Owner:DONGFANG TURBINE CO LTD

Lighting system

This invention relates to a lighting system (100) which provides front side lighting, where a main portion of the light is outputted in the front direction of the lighting system, and back side lighting, where a sub portion of the light is outputted in a back side direction of the lighting system. The lighting system is arranged such that light from a light unit (103) is mixed in a mixing chamber (105). The mixing chamber has a first light exit portion (106) which is arranged for outputting a main portion of the mixed light for front side lighting. The mixing chamber is further arranged with a second light exit portion (101) arranged in association with the mixing chamber for outputting a sub portion of the mixed light for back side lighting from the lighting system. The invention is based on an insight that by utilizing the mixing chamber in the lighting system, back side lighting is achieved and thereby hardly affecting the beam shape of the front side lighting from the lighting system.
Owner:KONINKLIJKE PHILIPS ELECTRONICS NV

Method for fabricating a lithographic reflection mask in particular for the patterning of a semiconductor wafer, and a reflection mask

A method for fabricating a lithographic reflection mask in particular for patterning of semiconductor wafers, is described, and can be used for extremely small feature sizes below 100 nm. In known lithographic methods with EUV radiation (extreme ultraviolet), for the mask fabrication, a multilayer reflection layer is applied to a substrate. An absorber layer is deposited after the multilayer layer is patterned above the multilayer layer or is completely introduced into the latter. In the case of the method according to the invention, in contrast, the absorber layer is applied between the substrate and the reflection layer and / or on the side areas of the reflection layer. This has the advantage of reducing CD changes due to shadowing of structures lying above the reflection layer. Further advantages are, inter alia, smaller structure displacements and reduced asymmetrical intensity profiles of the reflected beams of radiation.
Owner:POLARIS INNOVATIONS LTD

Thin-film AlGaInP light-emitting diode chip and its preparation method

PendingCN108198926AWith light reflectionFunctionalSemiconductor devicesOhmic contactQuantum well
The invention discloses a thin-film AlGaInP light-emitting diode chip and its preparation method. The light-emitting diode chip comprises a bonding substrate with positive and negative faces. From thefront surface of the bonding substrate upwards, it is sequentially provided with: a substrate side metal bonding layer, an epitaxial side metal bonding layer, a P surface diffusion barrier metal layer and a P surface reflection ohm contact layer; from the P surface reflection ohm contact layer to the top, it is sequentially provided with P-type current spreading layer, the P-type limiting layer,the P-side spatial layer, the multi-quantum well light-emitting region, the N-side spatial layer, the N-type limitation layer, the N-type coarse layer, the N-type ohm contact layer and the N electrode; and the reverse side of the bonding substrate is a P electrode. The P-plane reflecting ohm contact layer adopted by the invention has the functions of light reflection and ohm contact; by optimizingthe spacing distance of the block and the width of the N electrode through the blocking of the P-plane reflection ohm contact layer, the current injection concentration problem of the N-electrode corresponding region can be suppressed, and the N electrode shielding effect can be effectively reduced. The invention has the advantages of effectively improving the photoelectric conversion efficiency,simple structure and the like.
Owner:NANCHANG UNIV +1

Method to control mask profile for read sensor definition

A method for constructing a magnetoresistive sensor that avoids shadowing effects of a mask structure during sensor definition. The method includes the use of an antireflective coating (ARC) and a photosensitive mask deposited there over. The photosensitive mask is formed to cover a desired sensor area, leaving non-sensor areas exposed. A reactive ion etch is performed to transfer the pattern of the photosensitive mask onto the underlying ARC layer. The reactive ion etch (RIE) is performed with a relatively high amount of platen power. The higher platen power increases ion bombardment of the wafer, thereby increasing the physical (ie mechanical) component of material removal relative to the chemical component. This increase in the physical component of material removal result in an increased rate of removal of the photosensitive mask material relative to the ion mill resistant mask. This avoids the formation of a bulbous or mushroom shaped photoresist mask and therefore, avoids shadowing effects during subsequent manufacturing processes.
Owner:HITACHI GLOBAL STORAGE TECH NETHERLANDS BV

Method for manufacturing a magnetic read sensor with narrow track width using amorphous carbon as a hard mask and localized cmp

A method for manufacturing a magnetic read sensor at very narrow track widths. The method uses an amorphous carbon mask layer to pattern the sensor by ion milling, rather than a mask constructed of a material such as photoresist or DURIMIDE® which can bend over during ion milling at very narrow track widths. By using the amorphous carbon layer as the masking layer, the trackwidth can be very small, while avoiding this bending over of the mask that has been experienced with prior art methods. In addition, the track-width can be further reduced by using a reactive ion etching to further reduce the width of the amorphous carbon mask prior to patterning the sensor. The method also allows extraneous portions of the side insulation layer and hard bias layer to be removed above the sensor by a light CMP process.
Owner:WESTERN DIGITAL TECH INC

Wet-on-wet method for forming flocked adhesive article

A flocked article in which multiple adhesive layers or regions are formed by wet-on-wet printing techniques.
Owner:HIGH VOLTAGE GRAPHICS

Device and method for depositing organic material

A device for depositing an organic material includes a substrate; a mask having an opening portion and a shield portion; a fixing member for fixing the substrate and the mask to each other; a deposition source comprising a plurality of nozzles arranged in a first direction and configured to spray the organic material; and a plurality of shield plates near the plurality of nozzles on the deposition source. An angle θ between the substrate and a line extended from a distal end of one of the nozzles to a center of a distal end of a corresponding one of the shield plates is greater than or equal to a taper angle Φ of the shield portion of the mask.
Owner:SAMSUNG DISPLAY CO LTD

Simple dual-frequency dual-circularly-polarized parabolic reflector antenna feed source

ActiveCN102610927AGood polarization isolationGood frequency band isolationSimultaneous aerial operationsRadiating elements structural formsDual frequencyCircular disc
The invention discloses a simple dual-frequency dual-circularly-polarized parabolic reflector antenna feed source, which comprises a circular radiation patch which is fed by eight L-shaped probes. The simple dual-frequency dual-circularly-polarized parabolic reflector antenna feed source is characterized in that the eight L-shaped probes are equiangularly distributed around the circumference, the feed probes of frequency 1 and the feed probes of frequency 2 are distributed in a staggered way, wherein the distances of four of the feed probes from the centerlines of the vertical parts to the center of the radiation disc are changeable with frequency, i.e. when the frequency is high, the centerlines of the vertical parts of the probes are close to the center of the radiation disc and the radiation area is correspondingly reduced, and when the frequency is low, the centerlines are far away from the center of the radiation disc and the radiation area is correspondingly increased; and therefore approximately consistent directional diagrams are obtained within frequency bands, the two frequency bands have approximately consistent phase centers and wider working frequency bands are obtained within the two frequency bands. The feed source can work in a dual-circularly-polarized way within the two frequency bands at the same etime, the cross section is small, the structure is simple, the cost is low, the parabolic reflector antenna can be enabled to have high antenna efficiency and low side-lobe level within the two frequency bands and the two frequency bands can be enabled to have the advantages of better frequency band isolation performance, good polarization isolation performance and the like.
Owner:XINGDONG COMM TECH SUZHOU +1

Ring illuminator and fusion recognition method utilizing ring illuminator illumination based on shape, grain and weight of tool

ActiveCN103413141AReduce shadowing effectAccurately obtain texture informationCharacter and pattern recognitionPoint lightLight beam
The invention discloses a ring illuminator and a fusion recognition method utilizing ring illuminator illumination based on the shape, the grain and the weight of a tool. The ring illuminator and the fusion recognition method utilizing the ring illuminator illumination based on the shape, the grain and the weight of the tool are used for solving the technical problem that an existing ring illuminator cannot accurately obtain all the grain information of the tool. According to the technical scheme, the ring illuminator is composed of a main light source and a back light source, the main light source is composed of four concentric circle light emitting bands which are fixed to a base plate and are formed by LED point light sources, the light emitting bands are composed of LEDs with equal distances, and rotation invariance is maintained for the shot tool grain. The back light source is composed of a supporting plate a diffuse reflection plate, a box body, light sources and a reflecting layer. The box body is made of PVC plates, the reflecting layer is a reflecting film, the reflecting film is evenly attached to the inner surface of the box body, the LEDs are evenly arranged on the lower bottom plate of the box body at intervals to form the light sources, the diffuse reflection plate is arranged above the light sources and below the supporting plate, scattering light beams which are low in luminance and good in uniformity are generated, the shadow effect of the tool under natural light is eliminated, and all the grain information of the tool is obtained.
Owner:NORTHWESTERN POLYTECHNICAL UNIV

Image fusion-based monocular vision road identification algorithm

The invention discloses an image fusion-based monocular vision road identification algorithm. An original image and an illumination invariant image are processed by using convolutional neural networksof two input channels, and image information is fused in processing to obtain a probability value that each pixel point in the image is a road region; and then a conditional random field is constructed, each pixel point in the image is represented with each node in the conditional random field, and the nodes in the conditional random field are segmented to obtain a road identification result of the whole image. The influence of complex illumination and shadows on road identification is eliminated, so that the road identification accuracy and robustness are improved.
Owner:ZHEJIANG UNIV

Reflective photomask and reflective photomask blank

A reflective photomask and reflective photomask blank, able to reduce the shadowing effect causing a deterioration phenomenon in the accuracy of transfer by EUV light. The reflective photomask is a photomask for reflecting EUV light and radiating the reflected light, and is provided with a substrate, a high reflection part formed on the substrate, and low reflection parts formed and patterned on the high reflection part, characterized in that the patterned low reflection parts each have at least one stacked layer, and at least one layer of the patterned low reflection part is a layer including Sn and oxygen.
Owner:TOPPAN PRINTING CO LTD

An in-situ mask changing device and an application method thereof

The invention relates to an in-situ mask changing device. The device comprises a movable mask plate support. At least two openings are formed on the mask plate support. A mask plate is placed in each opening. A movable substrate movement drive device is arranged beside the mask plate support. The substrate movement drive device is detachably connected with a substrate matching with each mask plate. The substrate movement drive device can push the substrate into the openings and in contact with the mask plates. The substrate movement drive device can further drive the substrate away from the openings. The in-situ mask transforming device can be applied to a vacuum chamber, realize the change of the mask plates in a vacuum environment, and efficiently avoid pollution to the sample. In addition, the device further suppresses the shadow effect caused by the mask plates in the preparation process and guarantees the film quality. The invention further relates to an application method of the in-situ mask changing device. The method can realize automatic change of the mask plates in a preparation environment, save the change time of the mask plates and improve the preparation efficiency. Moreover, the operation is more convenient.
Owner:INFINITE MATERIALS TECH
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