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A method for chemical mechanical polishing of silicon nitride ceramics

A silicon nitride ceramic and mechanical polishing technology, which is applied in the direction of polishing compositions containing abrasives, can solve the problems of rough surface and general performance of silicon nitride, and achieve smooth surface, short polishing time and improved polishing quality.

Active Publication Date: 2016-11-30
威海圆环先进陶瓷股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the performance of silicon nitride polished by this method is average, and the surface is rough

Method used

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  • A method for chemical mechanical polishing of silicon nitride ceramics
  • A method for chemical mechanical polishing of silicon nitride ceramics

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A kind of silicon nitride ceramic chemical mechanical polishing method, described method adopts the polishing fluid that has following composition: A kind of chemical mechanical polishing fluid is made of CeO 2 Abrasive particles, Cr 2 o 3 Abrasive particles, Al 2 o 3 Abrasive particle composition and water composition. The CeO 2 The mass percentage of abrasive particles in the polishing liquid is 15%, and the Cr 2 o 3 The mass percentage of abrasive particles in the polishing liquid is 2%, and the Al 2 o 3 The mass percentage of abrasive particles in the polishing liquid is 2%. The polishing time is 1h.

Embodiment 2

[0027] A kind of silicon nitride ceramic chemical mechanical polishing method, described method adopts the polishing fluid that has following composition: A kind of chemical mechanical polishing fluid is made of CeO 2 Abrasive particles, Cr 2 o 3 Abrasive particles, Al 2 o 3 Abrasive particle composition and water composition. The CeO 2 The mass percentage of abrasive grains in the polishing liquid is 60%, and the Cr 2 o 3 The mass percentage of abrasive particles in the polishing liquid is 2%, and the Al 2 o 3 The mass percentage of abrasive particles in the polishing liquid is 2%. The polishing time is 7h.

Embodiment 3

[0029] A kind of silicon nitride ceramic chemical mechanical polishing method, described method adopts the polishing fluid that has following composition: A kind of chemical mechanical polishing fluid is made of CeO 2 Abrasive particles, Cr 2 o 3 Abrasive particles, Al 2 o 3 Abrasive particle composition and water composition. The CeO 2 The mass percentage of abrasive particles in the polishing liquid is 40%, and the Cr 2 o 3 The mass percentage of abrasive grains in the polishing liquid is 10%, and the Al 2 o 3 The mass percentage of abrasive grains in the polishing liquid is 10%. The polishing time is 5h.

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Abstract

The invention relates to a chemico-mechanical polishing method of silicon nitride ceramic. The method adopts a polishing solution. The chemico-mechanical polishing solution is composed of CeO2 grinding granules, Cr2O3 grinding granules, Al2O3 grinding granules and water. Compared with the prior art, the polishing method provided by the invention has the advantages of high polishing speed, short polishing time, higher production efficiency and lower manufacturing cost; and after being polished by the method, the silicon nitride ceramic has smooth surface, and the polishing quality of the silicon nitride can be obviously enhanced.

Description

technical field [0001] The invention relates to a method for chemical mechanical polishing of silicon nitride ceramics. Background technique [0002] With the continuous development of semiconductor technology and the continuous increase of interconnection layers in large-scale integrated circuits, the planarization technology of conductive layers and insulating dielectric layers has become particularly critical. In the 1980s, the chemical mechanical polishing (CMP) technology pioneered by IBM is considered to be the most effective method for global planarization. [0003] Chemical-mechanical polishing consists of chemical action, mechanical action, and a combination of these two actions. It usually consists of a grinding table with a polishing pad, and a grinding head for carrying chips. [0004] Silicon nitride (Si 3 N 4 ) Ceramic balls are considered to be ideal rolling elements for high-speed, high-precision bearings due to their high strength, high modulus of elasti...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 朱忠良
Owner 威海圆环先进陶瓷股份有限公司