Fine mask screening process analysis method

Abstract

The invention discloses a fine mask screening process analysis method. The method includes that on the basis of simulation functions of ANSYS, finite element models of fine masks and a finite element model of a metal frame are established so that proper tensile force used for stretching the fine masks and enable the fine masks to be welded in front of the metal frame and correspond to true counter force applied to the metal frame. Physical tests are not needed during analysis, so that damage to the fine masks can be effectively avoided, and test cost is effectively saved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an analysis method for a fine mask plate stretching process. Background technique [0002] When preparing an electroluminescent device, each layer of material in the electroluminescent device needs to be evaporated onto the array substrate through an evaporation process, and in the evaporation process, a corresponding fine mask needs to be used. [0003] However, due to the high temperature generated during the evaporation process, the fine mask will thermally expand at this time, which will cause the fine mask to sag under the action of gravity, and the geometric shape of the fine mask will change, resulting in evaporation. The plating material cannot be evaporated to the specified position. [0004] figure 1 It is a schematic diagram of welding multiple fine mask plates and metal frames, such as figure 1 As shown, in order to solve the above technical problems, in the prior...

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Problems solved by technology

[0006] The invention provides a fine mask stretching process analysis method, which is used to solve the technical problem of high test cost caused by physical testing when analyzing the fine mask stretching process in the prior art

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