Iron oxide film with exchange bias effect and preparation method of iron oxide film
A technology of iron oxide film and ferrous oxide, applied in the field of iron oxide film with exchange bias effect and preparation thereof
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[0026] The invention relates to an iron oxide thin film with a strong exchange bias effect and a preparation method thereof, wherein the structure of the iron oxide thin film (without removing the strontium titanate layer or the strontium titanate substrate) is: triiron tetroxide ( Fe 3 o 4 ) / ferrous oxide (FeO) / strontium titanate (SrTiO 3 ) transition layer / single crystal substrate, or Fe 3 o 4 / FeO / SrTiO 3 single crystal substrate. SrTiO 3 The interface is the key to the exchange bias effect of the system: vacuum (≤3×10 -4 Pa) After high temperature (300-600°C) annealing, SrTiO 3 Ti 3+ -Vo, thus forming an epitaxial layer of ferrous oxide (FeO) at the interface at the initial stage of film growth, and the epitaxial Fe 3 o 4 Subsequent growth of the thin layer. Antiferromagnetic FeO and Ferrimagnetic Fe 3 o 4The exchange coupling effect between them makes the system exhibit a strong exchange bias effect. The present invention controls the film growth interface, ...
Embodiment 1
[0042] In a pulsed laser deposition system, SrTiO with (001) orientation 3 The single crystal is used as the substrate, and the iron oxide film with a thickness of about 26nm is prepared;
[0043] 1) The (001)SrTiO polished on one side 3 The single crystal substrate is placed in the reaction chamber of the pulsed laser deposition system, and the background of the pulsed laser deposition system is evacuated to ≤5×10 -4 Pa, heat the substrate to 400°C, then vacuum the reaction chamber to ≤3×10 -4 Pa; dense Fe with a purity greater than 99.99% 2 o 3 Ceramic block as target material, laser energy 7J / cm 2 , deposition rate 1.5 ~ 2nm / min. After deposition, in high vacuum (≤3×10 -4 Pa) ambient temperature is lowered to room temperature at a rate of 6°C / min, so as to obtain figure 1 The iron oxide thin film of (b) structure;
[0044] 2) adopt superconducting quantum interferometer (SQUID) to measure the sample that embodiment 1 makes under H=1T and H=-1T magnetic field cooling...
Embodiment 2
[0047] In a pulsed laser deposition system, SrTiO 3 PMN-PT and MgAl as the transition layer 2 o 4 The single crystal is used as the substrate, and the iron oxide film with a thickness of about 26nm is prepared;
[0048] 1) PMN-PT and MgAl with (001) orientation in a pulsed laser deposition system 2 o 4 The single crystal is used as the substrate to prepare SrTiO with a thickness of about 10nm 3 Floor. Preparation process parameters: substrate temperature T = 700°C, deposition oxygen pressure 0.1Pa, laser energy 5J / cm 2 ;
[0049] 2) In the pulsed laser deposition system, the SrTiO prepared in step (1) 3 / PMN-PT, SrTiO 3 / MgAl 2 o 4 And PMN-PT, MgAl 2 o 4 A single crystal is used as a substrate, and an iron oxide film with a thickness of about 26 nm is prepared. Preparation process is with embodiment 1;
[0050] 3) Measure the magnetic properties of the sample with a superconducting quantum interferometer (SQUID), and measure the M-H curve of the sample at tempera...
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