Manufacturing method of polyurethane polishing pad

A polishing pad and polyurethane technology, applied in the manufacture of tools, metal processing equipment, abrasives, etc., can solve the problems of complicated process, high difficulty, and insufficient effect, and achieve process energy saving, increase hardness and water permeability, high hardness and durability The effect of grinding performance

Active Publication Date: 2015-03-04
INST OF CHEM CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this method needs to increase the hardness and water permeability through thermal aggregation of polyurethane resin, and the effect after improvement is not significant enough. In addition, this method requires two k

Method used

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  • Manufacturing method of polyurethane polishing pad
  • Manufacturing method of polyurethane polishing pad
  • Manufacturing method of polyurethane polishing pad

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] The raw materials and weight percentages of each component in the soaking liquid are:

[0043] Polyurethane resin 12.8%;

[0044] DMF 87.2%.

[0045] Under room temperature, 3.0mm is thick, and the polyester non-woven fabric of 600 grams is put into by 12.8wt% polyurethane resin and 87.2wt% DMF in the polyurethane resin dipping solution that obtains after mixing and stirring, under the extrusion of metal roller The polyurethane resin impregnation solution is fully immersed in the polyester non-woven fabric, then taken out, after scraping off the excess polyurethane resin impregnation solution on the surface of the polyester non-woven fabric with a scraper, put it into a water tank for pre-coagulation for 10 minutes ( When performing pre-coagulation in water, control the mass percentage of DMF in the water to ≤2%), take it out, and directly send it to an oven at 150°C for 22 minutes to dry and dry it, and then you can get a product with good water permeability, hardness...

Embodiment 2

[0049] The raw materials and weight percentages of each component in the soaking liquid are:

[0050] Polyurethane resin 5%;

[0051] DMF 95%.

[0052] At room temperature, put 4.0mm thick polyester non-woven fabrics with a weight of 900 grams into the polyurethane resin impregnation solution obtained by mixing and stirring 5wt% polyurethane resin and 95wt% DMF, and press the metal roller to make the polyurethane The resin impregnation solution is fully immersed in the polyester non-woven fabric, and then taken out, after scraping off the excess polyurethane resin impregnation solution on the surface of the polyester non-woven fabric with a scraper, put it into a water tank loaded with water for pre-coagulation for 5 minutes (in water When performing pre-condensation, control the mass percentage of DMF in the water to ≤2%), take it out, and directly send it to an oven at 100°C for 50 minutes to dry and dry it to obtain polyurethane polishing with good water permeability, hard...

Embodiment 3

[0055] The raw materials and weight percentages of each component in the soaking liquid are:

[0056] Polyurethane resin 20%;

[0057] DMF 80%.

[0058] At room temperature, put 2.0mm thick polyester non-woven fabric with a weight of 300 grams into the polyurethane resin impregnation solution obtained by mixing and stirring 20wt% polyurethane resin and 80wt% DMF, and press the metal roller to make the polyurethane The resin impregnation solution is fully immersed in the polyester non-woven fabric, and then taken out, after scraping off the excess polyurethane resin impregnation solution on the surface of the polyester non-woven fabric with a scraper, put it into a water tank loaded with water for pre-coagulation for 10 minutes (in water When performing pre-coagulation, control the mass percentage of DMF in the water to ≤2%), take it out, and directly send it to an oven at 180°C for 15 minutes to dry and dry it for 15 minutes to obtain polyurethane polishing with good water pe...

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Abstract

The invention relates to a manufacturing method of a polyurethane polishing pad with high water permeability, hardness and abrasion resistance, and the polyurethane polishing pad manufactured by using the method. The method comprises the following steps: soaking a non-woven fabric or a knitted fabric serving as a substrate material into socking liquid (polyurethane resin, an organic solvent and a polishing agent); picking the soaked non-woven fabric or knitted fabric out, soaking the non-woven fabric or knitted fabric into pre-coagulation soaking liquid in water, and drying to obtain the polyurethane polishing pad. By adopting the manufacturing method of the polyurethane polishing pad, the hardness and the water permeability of a product can be enhanced simultaneously. For example, the hardness of the product is 80 degrees, and the water permeability is 248ml/cm<2>.h by using the conventional manufacturing process. The hardness of the product is up to 90 degrees, and the water permeability is 3,522ml/cm<2>.h by using the manufacturing method disclosed by the invention. By adopting the manufacturing method of the polyurethane polishing pad, the use of the organic solvent can be reduced greatly, and the production cost is reduced greatly. A process is low in energy consumption, and is environmentally friendly.

Description

technical field [0001] The invention relates to a polyurethane polishing pad that can be used to polish magnetic substrates, optical substrates, semiconductor substrates, etc., in particular to a preparation method of a polyurethane polishing pad with good water permeability, hardness and wear resistance and the obtained by the method polyurethane polishing pads. Background technique [0002] The polishing industry developed almost at the same time as glass manufacturing, automobile production, mechanical processing, wood industry and hardware industry. With the rapid development of these industries in recent years, the requirements for the variety and performance of polishing abrasives are getting higher and higher. Its demand is also increasing, making the polishing industry gradually develop into an important industry. [0003] The polyurethane polishing pad reinforced with non-woven fabric is a porous polishing material widely used in semiconductor materials such as sil...

Claims

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Application Information

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IPC IPC(8): B24B37/24B24D11/02
CPCB24B37/24B24D11/02
Inventor 马永梅张晓丹成惠民曹新宇向前赵斌安晶晶
Owner INST OF CHEM CHINESE ACAD OF SCI
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