Grooved diode with floating island structure
A trench type, diode technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problem of unsatisfactory high temperature reliability of Schottky junctions, and achieve good reliability, low forward voltage drop, and reverse recovery short time effect
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Embodiment 1
[0028] Such as figure 2 As shown, this example includes an N-type semiconductor substrate 7, a cathode 8 positioned at the bottom of the N-type semiconductor substrate 7, an N-type semiconductor drift region 6 positioned on the upper layer of the N-type semiconductor substrate 7, and a A gate oxide layer 2 and an anode 1 located on the upper layer of the gate oxide layer 2; the gate oxide layer 2 is a trench structure; a first N-type semiconductor doped region 3, a floating P island 4 and a second N-type semiconductor doped region 5; the second N-type semiconductor doped region 5 is located on the sidewall of the trench and connected to the gate oxide layer 2; the floating P island 4 is located between the second N-type semiconductor doped region 5 Between; the first N-type semiconductor doped region 3 is located on the top of the second N-type semiconductor doped region 5 and the floating P island 4, and is connected to the anode 1.
[0029] This example works as follows: ...
Embodiment 2
[0033] Such as Figure 4 As shown, the structure of this example is based on Example 1, and the floating P island 4 and the second N-type semiconductor doped region 5 are shortened to the region above the trench at the same time. The working principle of this example is the same as that of Example 1. same.
Embodiment 3
[0035] Such as Figure 5 As shown, the structure of this example is based on Example 1, and the floating P island 4 and the second N-type semiconductor doped region 5 are simultaneously extended to the region below the trench. The working principle of this example is the same as that of Example 1. same.
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