Conductive film
A conductive film and conductive part technology, applied to conductive layers on insulating carriers, electrical components, electronic equipment, etc., can solve the problems of reduced aperture ratio, reduced transparency, and easily conspicuous intersections, achieving high transparency. , Reduce the occurrence of streaks, ensure the effect of transparency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0174] Hereinafter, the present invention will be described more specifically with reference to examples of the present invention. In addition, materials, usage amounts, ratios, processing contents, processing procedures, and the like shown in the following examples can be appropriately changed as long as they do not depart from the spirit of the present invention. Therefore, the scope of the present invention should not be limitedly interpreted by the specific examples shown below.
no. 1 Embodiment
[0176] In the first example, in Examples 1 to 11, the line width of the thin metal wires and the length of one side of the lattice were changed, and the visibility, aperture ratio, and streaks of the conductive film were evaluated. The detailed items and evaluation results of Examples 1 to 11 are shown in Table 3 to be described later.
[0177] (Example 1)
[0178] (Silver halide photosensitive material)
[0179] An emulsion containing silver iodobromochloride particles (I=0.2 mol%, Br=40 mol%) with an average spherical equivalent diameter of 0.1 μm and 10.0 g of gelatin with respect to 150 g of Ag in an aqueous medium was prepared.
[0180] In addition, adding K to this emulsion 3 Rh 2 Br 9 and K 2 IrCl 6 so that the concentration becomes 10 -7 (mol / mol silver), Rh ions and Ir ions are doped in silver bromide particles. Add Na to this emulsion 2 PdCl 4 , and then use chloroauric acid and sodium thiosulfate to carry out gold-sulfur sensitization, and then apply it to...
Embodiment 2
[0192] In Example 2, except that the length La of one side of the grid 24 was 400 μm and the length Lb of the streak suppressing portion 26 was 100.0 μm, the conductive film of Example 2 was produced in the same manner as in the above-mentioned Example 1.
PUM
| Property | Measurement | Unit |
|---|---|---|
| melting point | aaaaa | aaaaa |
| melting point | aaaaa | aaaaa |
| melting point | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 