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Chromium target manufacturing method

A manufacturing method and technology for chromium targets, which are applied in the field of chromium target manufacturing, can solve the problems of high manufacturing cost of chromium targets, high requirements for manufacturing equipment, harsh process conditions, etc. Density effect

Active Publication Date: 2017-05-31
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the hot isostatic pressing process often needs to be carried out under the conditions of greater than 100MPa and 1200°C. The hot isostatic pressing process has high requirements for manufacturing equipment, harsh process conditions, high manufacturing costs of chromium targets, and low yield.

Method used

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Embodiment Construction

[0029] As mentioned in the background art, the existing manufacturing methods of chromium targets have high requirements on process equipment and harsh manufacturing process conditions, resulting in high manufacturing costs and low yields of chromium targets. For this reason, the present invention provides a new method for manufacturing a chromium target. The method for manufacturing a chromium target adopts a hot pressing sintering process, and cooperates with specific temperature, pressure control and other process settings to obtain a density greater than 99.5 %, the grain size is less than 50μm, and the high-quality chromium target with uniform internal structure meets the requirements of the sputtering coating process for the chromium target. In addition, compared with the existing chromium target manufacturing process, the chromium target manufacturing method provided by the present invention requires less process equipment, and the process conditions are easy to control,...

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Abstract

The invention discloses a chromium target production method. The method comprises the following steps: a hot-pressed sintering process is adopted to perform the compactness treatment for chromium powder to form a chromium target blank under the conditions of a preset temperature of 1100-1300 DEG C and a preset pressure higher than 30 MPa; and the chromium target blank is cooled to form a chromium target. The chromium target production method can form the chromium target with the compactness up to 99.5%, the average grain size smaller than 50 microns and the uniform structure. Compared with a hot isostatic pressure process, the process equipment requirements and the process conditions of the chromium target production process are reduced, and the process cost is saved.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a method for manufacturing a chromium target. Background technique [0002] Chromium is a silver-white metal, which has good corrosion resistance to acids and alkalis, and has a strong passivation ability in the atmosphere, does not easily react with air, and can maintain luster for a long time, and chromium also has a high hardness and resistivity. [0003] Based on the above advantages, chromium has been widely used in surface engineering of mechanical functional thin films, microelectronic thin films, electromagnetic functional thin films, and optical thin films. Among them, in the application of microelectronic thin films and electromagnetic functional thin films, the sputtering coating process is mostly used to form chromium thin films. In the sputtering coating process, the quality of the chromium target used has an important influence on the formed chromium fil...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B22F3/14C23C14/34
Inventor 姚力军赵凯相原俊夫大岩一彦潘杰王学泽袁海军
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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