Evaporation device and its waterproof refueling method
A technology of evaporation and evaporation source, which is applied in the directions of vacuum evaporation plating, sputtering plating, ion implantation plating, etc., which can solve the problems of product yield decline, vacuum degree reduction, difficulty in adjusting to the ideal range, etc.
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[0021] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. Furthermore, the directional terms mentioned in the present invention are, for example, up, down, top, bottom, front, back, left, right, inside, outside, side, surrounding, central, horizontal, transverse, vertical, longitudinal, axial, The radial direction, the uppermost layer or the lowermost layer, etc. are only directions referring to the attached drawings. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention.
[0022] Please refer to figure 1 As shown, the evaporation device 100 of an embodiment of the present invention, wherein the evaporation device 100 includes an evaporation chamber 2, a first evaporation source 3, a first shielding unit 4, a second evaporation source 5. A second shielding unit 6 , a third...
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