Semiconductor component and manufacturing method thereof

Abstract

The invention discloses a semiconductor assembly and a manufacturing method thereof. The semiconductor assembly comprises a silicon substrate, a first passivation layer, and a second passivation layer. The silicon substrate comprises a plurality of silicon through-vias and a plurality of conductive columns. The first passivation layer comprises a flat portion and an annular portion. The height of the annular portion is lower than the height of the top surface of the conductive column. The second passivation layer is covered on the first passivation layer. The height of the second passivation layer is lower than the height of the annular portion of the first passivation layer. Through arranging the first passivation layer and the second passivation layer on the back surface of the silicon substrate, after etching, the first passivation layer still wraps the back surface of the silicon substrate, reducing possibility that the first passivation layer is etched too deep and extends to the back surface of the silicon substrate, so as to reduce circuit short circuit risk of a semiconductor assembly finished product and improve manufacturing yield rate.

Description

technical field [0001] The present invention relates to a semiconductor component and its manufacturing method, in particular to a semiconductor component provided with two passivation layers with different etching rates and its manufacturing method. Background technique [0002] Nowadays, the electronic product design industry is moving towards the trend of lightness, thinness, and shortness, and semiconductor packaging technology has also developed packaging technologies such as stacked semiconductor element packaging. The semiconductor elements are packaged in the same packaging structure, so that the packaging density can be increased to reduce the size of the package body, and the three-dimensional stacking can be used to shorten the signal transmission path between the semiconductor elements, so as to increase the signal transmission speed of the semiconductor. At present, the existing stacked semiconductor device packaging manufacturing method is to stack chips on a w...

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Problems solved by technology

[0004] However, due to the plasma etching of the passivation layer, a ring groove will be formed on the periphery of the through-silicon via (TSV), and when the etching is over-etched, the ring groove will easily extend to the wafer surface, causing the energy of the plasma to flow along the TSV. The ring groove contacts the surface of the wafer to produce a partial discharge effect, which causes the circuit of the wafer (such as the circuit on the other side of the active surface) to be short-circuited, resulting in a decrease in manufacturing yield

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