Optical element axial jogging adjustment device of bridge type flexible hinge structure

Abstract

The invention provides an optical element axial jogging adjustment device of a bridge type flexible hinge structure, and belongs to the technical field of photolithographic objective lens structural design and installation and adjustment. The jogging adjustment device aims to solve the problems that in the prior art, a required structure is large in space, many drivers are used and it is difficult to conduct structural design and manufacturing. The jogging adjustment device comprises a lens base connection piece, a lens frame connection piece and two jogging adjustment mechanism sets. The two jogging adjustment mechanism sets are arranged between the lens base connection piece and the lens frame connection piece and are symmetrical relative to a Y axis. Each jogging adjustment mechanism set comprises two bridge type flexible hinge sets and one input parallel hinge set. The two bridge type flexible hinges in each jogging adjustment mechanism set are connected by input parallel hinges and are symmetrical relative to an X axis. The input parallel hinges transmit the radial action force F to the bridge type flexible hinges, the bridge type flexible hinges convert the radial action force F to axial action force, and the axial action force is acted on the lens frame connection piece. The optical element axial micro adjustment device is easy to machine and manufacture, the drivers are arranged in the radial direction of optical elements and an adjustment structure is easy to design and manufacture.

Description

technical field [0001] The invention belongs to the technical field of structure design and adjustment of lithography objective lens, and designs an axial micro-motion adjustment device that can be used for optical elements in a lithography objective lens system, and specifically relates to an axial micro-motion of an optical element with a bridge-type flexible hinge structure Adjustment device. Background technique [0002] Lithography equipment is the key equipment in the manufacturing process of large-scale integrated circuits. In recent years, with the continuous improvement of the fineness of the line width of integrated circuits, the resolution of projection optical equipment has gradually improved. At present, the ArF excimer laser with a wavelength of 193.368nm Engraving equipment has become the mainstream equipment for 90nm, 65nm and 45nm node integrated circuit manufacturing. In the assembly process of projection lithography objective lens, in order to obtain good...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to propose a bridge-type flexible hinge structure optical element axial micro-adjustment device, to solve the problems existing in the prior art that require a large structural space, use many drivers, and make structural design and manufacture difficult

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