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A liquid quantitative supply device

A quantitative supply and liquid technology, applied in the direction of liquid distribution, transportation or transfer devices, distribution devices, special distribution devices, etc., can solve the problems of air bubbles, affecting the process effect, liquid waste, etc., and achieve low production cost and simple device structure , the effect of reducing the amount of labor

Active Publication Date: 2017-09-29
SHENYANG KINGSEMI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Part of the gas will be dissolved in the liquid pressed out of the sealed barrel by using compressed gas, and bubbles will be generated during the process, which will affect the process effect
In addition, it is difficult to control the liquid flow rate supplied each time in this way, which will cause liquid waste in the process

Method used

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  • A liquid quantitative supply device

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Embodiment Construction

[0015] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0016] Such as figure 1 As shown, the present invention includes a gas pressure regulating device 1, a liquid replenishment barrel 9, a liquid supply tank 10, a nozzle connecting pipe 7, a gas source and a control system, wherein the liquid replenishment barrel 9 is connected to the gas source and the supply liquid through a gas pipeline and a liquid replenishment pipeline respectively. The liquid supply tank 10 is connected, and the liquid replenishment pipeline is provided with a liquid supply medicine liquid valve 4, and the nozzle connecting pipe 7 is located below the liquid supply tank 10, and is connected with the liquid supply tank 10 through the liquid supply pipeline, and the liquid supply pipe A liquid supply liquid medicine valve 6 is provided on the road, and both the liquid replenishment liquid medicine valve 4 and the liquid supply liquid medic...

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Abstract

The invention belongs to the technical field of wafer coating and developing technology, in particular to a liquid quantitative supply device. Including liquid replenishment barrel, liquid supply tank, nozzle connecting pipe, gas source and control system, wherein the liquid replenishment barrel is respectively connected to the gas source and liquid supply tank through the gas pipeline and the liquid replenishment pipeline, and the liquid replenishment pipeline is provided with a liquid replenishment liquid valve , the nozzle connecting pipe is located below the liquid supply tank and is connected to the liquid supply tank through a liquid supply pipeline. The valves are all connected to the control system, and the control system keeps the distance between the working position of the liquid level in the liquid supply tank and the nozzle connecting pipe constant through the liquid replenishment liquid valve and the liquid supply liquid valve, so as to realize the liquid under constant pressure. Quantitative supply. The present invention utilizes the pressure generated by the liquid's own weight for supply, is connected with a control system to realize automatic liquid replenishment and quantitative supply, and can perform bubble removal work on the liquid when the liquid is supplied.

Description

technical field [0001] The invention belongs to the technical field of wafer coating and developing technology, in particular to a liquid quantitative supply device. Provide quantitative chemical solution in the process of forming a protective film on the semiconductor wafer or its coating and developing the wafer after exposure. Background technique [0002] At present, in the process of forming a protective film on the semiconductor wafer or its coating and developing the wafer after exposure, the known liquid supply device mainly adopts the mode of pump supply or pressurized gas from the sealed barrel. A part of the gas will be dissolved in the liquid pressed out of the sealed barrel by using compressed gas, and bubbles will be generated during the process, which will affect the process effect. In addition, it is difficult to control the liquid flow rate supplied each time in this way, which will cause liquid waste in the process. Contents of the invention [0003] In...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B67D7/02B67D7/78B67D7/30B67D7/76
Inventor 卢继奎胡延兵
Owner SHENYANG KINGSEMI CO LTD
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