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Photobioreactor system for air purification

A reactor and air technology, applied in the field of air purification, can solve problems affecting the performance of photobioreactors, and achieve the effect of efficient removal

Inactive Publication Date: 2015-04-29
NANO & ADVANCED MATERIALS INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, local climate affects photobioreactor performance when removing CO2

Method used

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  • Photobioreactor system for air purification
  • Photobioreactor system for air purification
  • Photobioreactor system for air purification

Examples

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Effect test

example 1

[0063] make use of figure 1 The invention shown to purify CO 2 polluted air. Chlorella sp. was maintained at 1,200,000 microalgal cells / mL substrate in the modified BBM. The temperature of the reactor tank was 25°C. LED mechanism at 200μmol / m 2 the s -1 shine light. CO of inlet gas 2 The concentration was 11.5% and its flow rate was 600 mL / min. After 24 hours, the CO of the outlet gas 2 The concentration was measured to be 3.5%.

example 2

[0065] make use of figure 2 The invention shown to purify CO 2 polluted air. Chlorella species were maintained at 1,200,000 microalgal cells / mL substrate in the modified BBM. The temperature of the reactor tank was 20°C. LED mechanism at 80μmol / m 2 the s -1 shine light. CO of inlet gas 2 The concentration was 500 ppm and its flow rate was 350 mL / min. After 5 days, the CO of the outlet gas 2 The concentration was measured to be 130 ppm.

example 3

[0067] The effects of temperature and light intensity on the growth rate of Chlorella species were studied. The specific growth rate of Chlorella species ( Figure 3A ). It can be seen that up to 450 μmol / m 2 the s -1 The growth of Chlorella species increased with the increase of light intensity. Chlorella species grow above 450 μmol / m 2 the s -1 sudden decrease in light intensity. Then studied at a constant 7.5% v / v carbon dioxide concentration and 105 μmol / m 2 the s -1 Specific growth rate of Chlorella species at different temperatures under light intensity. exist Figure 3B It can be seen that up to a temperature of 35 °C, the growth of Chlorella species is higher at higher temperatures, after which the growth of Chlorella species decreases dramatically at higher temperatures. These results show that optimized microalgae growth for photosynthetic carbon dioxide removal is promoted in the photobioreactor system of the present invention.

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Abstract

The present invention relates to air purification. The present invention provides a system for reducing carbon dioxide concentration in air in locations with sub-tropical to temperate climates and method of reducing carbon dioxide concentration using the system.

Description

[0001] Cross References to Related Applications [0002] Pursuant to 35 U.S.C. §119(e), this application is a non-provisional patent application claiming the benefit of U.S. Provisional Patent Application No. 61 / 961,447, filed October 15, 2013, which is incorporated by reference in its entirety The disclosure of the application is incorporated herein. technical field [0003] The present invention relates to air purification. In particular, the invention relates to systems for reducing carbon dioxide concentrations in the air using photosynthetic organisms. The invention is especially suitable for use in subtropical and temperate climate regions. Background technique [0004] Emissions of greenhouse gases from vehicles and industries are one of the main contributors to global warming and contribute to an increase in the temperature of the earth. carbon dioxide (CO 2 ) account for 68% of greenhouse gases. The storage of CO by various methods has been extensively studied ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C12M1/38C12M1/04C12M1/00C12N1/12C12R1/89
CPCC12M21/02C12M29/06C12M41/12C12N1/12B01D53/85B01D2251/95B01D2257/504B01D2258/06B01D2259/802C12M31/02Y02E50/30Y02A50/20Y02C20/40
Inventor 张迪刘若天冯加晔吴嘉名
Owner NANO & ADVANCED MATERIALS INST
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