Dual-cavity excimer laser adopting dual-pass structure

An excimer laser and optical path technology, applied in the field of lasers, can solve the problems of thermal deformation, high component cost, difficult alignment of the optical path transmission system, etc., to improve the alignment accuracy, good heat dissipation effect, and reduce the difficulty of optical path alignment. Effect
CN104577684AActive Publication Date: 2015-04-29RAINBOW SOURCE LASER RSLASER
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
RAINBOW SOURCE LASER RSLASER
Publication Date
2015-04-29

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Abstract

The invention discloses a dual-cavity excimer laser adopting a dual-pass structure. The dual-cavity excimer laser comprises a main oscillation cavity (MO), a linewidth narrowing module (LNM), an output coupling mirror (OC), a power amplifier (PA), a first high-reflective mirror (M1), a PA light path transmission module (1) and a PA light path transposition module (2), wherein the main oscillation cavity (MO) and the power amplifier (PA) are arranged in a direction perpendicular to a horizontal plane; the PA light path transmission module (1) comprises three high-reflective mirrors; the PA light path transposition module comprises a double-faced reflective mirror; laser coming to the PA from the PA light path transmission module (1) and laser returned from the PA light path transposition module (2) are positioned in the same horizontal plane, and a tiny included angle is formed. According to the dual-cavity excimer laser, the difficulty in light path alignment can be reduced, the alignment precision can be improved, and the element cost also can be reduced; the dual-cavity excimer laser has the advantages of flexible structure and good heat dissipation effect.
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Description

technical field

[0001] The invention belongs to the technical field of lasers, and in particular relates to a double-cavity excimer laser adopting a double-pass structure. Background technique

[0002] Excimer lasers are currently the mainstream exposure light source used in large-scale integrated circuit chip manufacturing. With the improvement of the lithography industry's requirements for light source output power and line width control, lasers based on single-cavity structures have been unable to meet the requirements of power and line width at the same time. The emergence of dual-cavity excimer lasers has solved the problem of high average laser power and narrow linewidth, and has become the choice of laser system structure for exposure light sources for 90nm and below node lithography.

[0003] The dual-cavity structure excimer laser includes two discharge resonators. The main function of the master oscillator (Master Oscillator, referred to as MO) is to output high-q...

Claims

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