Dual-cavity excimer laser adopting dual-pass structure

An excimer laser and optical path technology, applied in the field of lasers, can solve the problems of thermal deformation, high component cost, difficult alignment of the optical path transmission system, etc., to improve the alignment accuracy, good heat dissipation effect, and reduce the difficulty of optical path alignment. Effect

Active Publication Date: 2015-04-29
RAINBOW SOURCE LASER RSLASER
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Problems solved by technology

[0007] The purpose of the present invention is to propose an excimer laser based on a double-pass structure, which overcomes the shortcomings of the existing double-pass structure excimer laser, such as difficult alignment of the optical path transmission system, high component cost and thermal deformation

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  • Dual-cavity excimer laser adopting dual-pass structure
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  • Dual-cavity excimer laser adopting dual-pass structure

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Embodiment Construction

[0020] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0021] The invention proposes an improved double-pass structure double-cavity excimer laser. figure 2 and image 3 It is a schematic structural diagram of a dual-cavity excimer laser based on a double-pass structure adopted in the present invention. in figure 2 A part of the laser including the main oscillation cavity is shown, the figure is a front view, the x direction in the figure is a direction on the horizontal plane, and the y direction is a vertical direction perpendicular to the horizontal plane; image 3 A part of the laser including the power amplification cavity is shown, the figure is a top view, and the x direction and the z direction in the figure are both directions on the horizontal plane.

[0022] S...

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Abstract

The invention discloses a dual-cavity excimer laser adopting a dual-pass structure. The dual-cavity excimer laser comprises a main oscillation cavity (MO), a linewidth narrowing module (LNM), an output coupling mirror (OC), a power amplifier (PA), a first high-reflective mirror (M1), a PA light path transmission module (1) and a PA light path transposition module (2), wherein the main oscillation cavity (MO) and the power amplifier (PA) are arranged in a direction perpendicular to a horizontal plane; the PA light path transmission module (1) comprises three high-reflective mirrors; the PA light path transposition module comprises a double-faced reflective mirror; laser coming to the PA from the PA light path transmission module (1) and laser returned from the PA light path transposition module (2) are positioned in the same horizontal plane, and a tiny included angle is formed. According to the dual-cavity excimer laser, the difficulty in light path alignment can be reduced, the alignment precision can be improved, and the element cost also can be reduced; the dual-cavity excimer laser has the advantages of flexible structure and good heat dissipation effect.

Description

technical field [0001] The invention belongs to the technical field of lasers, and in particular relates to a double-cavity excimer laser adopting a double-pass structure. Background technique [0002] Excimer lasers are currently the mainstream exposure light source used in large-scale integrated circuit chip manufacturing. With the improvement of the lithography industry's requirements for light source output power and line width control, lasers based on single-cavity structures have been unable to meet the requirements of power and line width at the same time. The emergence of dual-cavity excimer lasers has solved the problem of high average laser power and narrow linewidth, and has become the choice of laser system structure for exposure light sources for 90nm and below node lithography. [0003] The dual-cavity structure excimer laser includes two discharge resonators. The main function of the master oscillator (Master Oscillator, referred to as MO) is to output high-q...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/081H01S3/082
Inventor 李慧赵江山沙鹏飞宋兴亮范元媛单耀莹王倩蔡茜玮张立佳崔惠绒周翊王宇
Owner RAINBOW SOURCE LASER RSLASER
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