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A high-resolution mass spectrometry imaging system image acquisition semiconductor thin film, preparation method and application

一种高分辨质谱、成像系统的技术，应用在制备,高分辨质谱成像系统图像采集半导体薄膜领域，能够解决影响图像分辨率和质量准确度、离子初速度和方向不同、很难形成大小均匀等问题，达到无背景干扰、良好线性关系、性质稳定的效果

Active Publication Date: 2015-12-09
HUAZHONG NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The main disadvantage of the existing technology is that it is difficult to form crystals with uniform size and controllable shape, so that the spectra obtained by the laser at different scanning times are not reproducible, and there is no quantitative relationship between signal intensity and sample volume
Moreover, due to the difference in crystal size and morphology, the initial velocity and direction of the ions obtained after the laser bombards the sample molecules are different, which affects the resolution and mass accuracy of the image.
In addition, these small organic molecule matrices often generate a series of background peaks in the low-mass region, suppressing low-mass molecular signals, and severely contaminating the ion source

Method used

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  • A high-resolution mass spectrometry imaging system image acquisition semiconductor thin film, preparation method and application
  • A high-resolution mass spectrometry imaging system image acquisition semiconductor thin film, preparation method and application
  • A high-resolution mass spectrometry imaging system image acquisition semiconductor thin film, preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Preparation of high-resolution mass spectrometry imaging system image acquisition semiconductor thin film, which is used for imaging analysis of invisible fingerprints, the operation steps are as follows:

[0028] 1) Take a certain amount of (Bi) with an analytical balance 2 o 3 ) 0.07 (CoO) 0.03 (ZnO) 0.9 Semiconductor nanoparticles, such as 10mg, the type and amount of material can be determined according to different samples;

[0029] 2) burning the semiconductor nanoparticles obtained in step 1) in a muffle furnace at 350° C. for 1 hour to eliminate the pollution of the adsorbed organic molecules;

[0030] 3) The semiconductor nanoparticles obtained in step 2) are further ground with an agate mortar to make them uniformly dispersed;

[0031] 4) put the semiconductor nano-powder obtained in step 3) into the grinding tool of the tablet press, then put it into the tablet press, apply a pressure of 4800kg, and keep it under this pressure for 1 minute;

[0032] 5) ...

Embodiment 2

[0036] Preparation of high-resolution mass spectrometry imaging system image acquisition semiconductor film, which is used for mass spectrometry imaging of plant hormone jasmonic acid, the operation steps are as follows:

[0037] 1) Weigh a certain amount of (Bi2O3) with an analytical balance 0.07 (CoO) 0.03 (ZnO) 0.9 Semiconductor nanoparticles, such as 10mg, the type and amount of material can be determined according to different samples;

[0038] 2) burning the semiconductor nanoparticles obtained in step 1) in a muffle furnace at 350° C. for 1 hour to eliminate the pollution of the adsorbed organic molecules;

[0039] 3) The semiconductor nanoparticles obtained in step 2) are further ground with an agate mortar to make them uniformly dispersed;

[0040] 4) Put the semiconductor nano-powder obtained in step 3) into the grinding tool of the tablet press, then put it into the tablet press, apply a pressure of 2000kg, and keep it under this pressure for 1 minute to obtain a...

Embodiment 3

[0045] Preparation of semiconductor film for image acquisition of high-resolution mass spectrometry imaging system, which is used for mass spectrometry imaging of brain tissue cephalin, the operation steps are as follows:

[0046] 1) Weigh a certain amount of (Bi2O3) with an analytical balance 0.07 (CoO) 0.03( ZnO) 0.9 Semiconductor nanoparticles, such as 10mg, the type and amount of material can be determined according to different samples;

[0047] 2) burning the semiconductor nanoparticles obtained in step 1) in a muffle furnace at 350° C. for 1 hour to eliminate the pollution of the adsorbed organic molecules;

[0048] 3) The semiconductor nanoparticles obtained in step 2) are further ground with an agate mortar to make them uniformly dispersed;

[0049] 4) Put two-thirds of the semiconductor nano-powder obtained in step 3) into the grinding tool of the tablet press, then put it into the tablet press, apply a pressure of 4800kg, and keep it under this pressure for 1 minut...

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Abstract

The invention belongs to the field of mass-spectral imaging, and in particular relates to an image acquisition semiconductor film for a high-resolution mass-spectral imaging system, and a preparation method and application of the image acquisition semiconductor film. The preparation method of the image acquisition semiconductor film for the high-resolution mass-spectral imaging system comprises the following steps: weighing semiconductor nano-particles, putting the semiconductor nano-particles into a muffle furnace for calcining firstly, further grinding by using an agate mortar, and uniformly dispersing the semiconductor nano-particles so as to obtain semiconductor nano-powder; and finally, pressing the semiconductor nano-powder in a tablet press so as to obtain the semiconductor film. By utilizing the laser-induced tunnel electron capture principle of a semiconductor nano-material, a sample is molecularized and ionized without background interference; the limitation of a conventional MALDI substrate is overcome; the semiconductor film is simple and easy to obtain, steady in mass-spectral signal, uniform and smooth in surface and free of the background interference, and can be used for fingerprint analysis and animal and plant tissue slice analysis; the semiconductor film is particularly applied to accurate mass-spectral imaging of small molecular substances; and quality control and industrialization are carried out conveniently.

Description

technical field [0001] The invention belongs to the field of mass spectrometry imaging, and in particular relates to a high-resolution mass spectrometry imaging system image acquisition semiconductor thin film, a preparation method and an application. Background technique [0002] Mass-assisted laser desorption dissociation mass spectrometry is an analytical technique commonly used in mass spectrometry imaging at present. This technology covers the surface of tissue slices with an organic small molecule matrix that can absorb laser energy, and transfers the energy to the sample molecules to vaporize and ionize them. detected by a mass analyzer. In this technique, the mixing mode of organic small molecule matrix and sample molecules is the key, because it directly affects the accuracy, resolution, reproducibility of experimental results and the ability of quantitative analysis of the analysis results. [0003] In the existing technology, an organic solvent is often used to d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N27/64G01N1/28
CPCB82Y30/00C01G9/02C01G29/00C04B35/453C04B35/62218C04B35/62645C04B2235/3275C04B2235/3284C04B2235/3298G01N1/2813G01N27/628G01N33/4833H01J49/0004H01J49/0418G02B26/10H01J49/0031
Inventor 钟鸿英黄璐璐唐雪妹张文洋
Owner HUAZHONG NORMAL UNIV
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