Production method of grating electrode of solar cell
A solar cell and grid line technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of time-consuming and labor-intensive silicon substrates, increase production costs, and difficult to achieve fine film printing, and achieve good quality and production yield. high effect
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[0018] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0019] refer to Figure 1-2 The method for preparing solar cell grid electrodes of the present invention comprises the following steps: coating a layer of photosensitive dry film 2 on both sides of the silicon substrate 1 of the solar cell, specifically, the thickness of the dry film 2 is 10-100 μm After the film is pasted, the dry film 2 is flattened so that the dry film 2 is closely attached to the silicon substrate 1 . The silicon substrate 1 may be a silicon substrate on which a transparent conductive oxide film and a seed metal film are deposited through PVD.
[0020] A mask plate 3 with req...
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