Cleaning skin-care substrate and preparation method thereof

A matrix and cleaning technology, applied in the field of cleaning skin care matrix and its preparation, can solve the problems of affecting the stability and skin feel of paste, poor balance of overall efficacy, reducing mildness and the like
CN104739673AInactive Publication Date: 2015-07-01CHONGQING LINGDAO TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
CHONGQING LINGDAO TECH CO LTD
Publication Date
2015-07-01
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a cleaning skin-care substrate and a preparation method thereof. The cleaning skin-care substrate comprises the following components by mass fraction: 8-13% of lauric acid, 6-10% of stearic acid, 6-10% of palmitic acid, 3-6% of myristic acid, 1-4% of a first emulsifier, 1-3% of a second emulsifier, 10-15% of a first humectants, 1-3% of a pH regulator, 6-10.5% of a second humectants, 1.25-2.35% of a first thickener, 0.02-0.15% of a chelating agent, 6-11% of a first surfactant, 1.0-3.25% of a second surfactant, 0.85-2.25% of a third surfactant, 1.02-2.35% of a fourth surfactant, 0.82-1.54% of a second thickener, and the balance of water. According to the components and the component content, the cleaning skin-care substrate has relatively good tenderness, relatively good cleaning effect, low foaming performance good stability.
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Description

technical field

[0001] The invention belongs to the technical field of cleaning skin care products in the cosmetics industry, and in particular relates to a cleaning skin care base and a preparation method thereof. Background technique

[0002] In the process of using skin care products, face cleansing, as the first step in basic skin care in the morning and evening, is one of the essential links in skin care. With the progress of research and development technology of cleansing products, various types of cleansing products have appeared on the market, some of which are biased towards cleaning and decontamination capabilities, some of which focus on certain effects of auxiliary additives, and others that focus on cream stability, skin Sensitivity and other factors are recognized in the industry as conditions for judging whether a cleansing product is of high quality.

[0003] With the continuous improvement of the awareness level of today's consumers, the balance between th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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